The TaC Coated Epi Wafer Carrier by Semicera is engineered for superior performance in epitaxial processes. Its tantalum carbide coating offers exceptional durability and high-temperature stability, ensuring optimal wafer support and enhanced production efficiency. Semicera’s precision manufacturing guarantees consistent quality and reliability in semiconductor applications.
TaC coated epitaxial wafer carriers are usually used in the preparation of high-performance optoelectronic devices, power devices, sensors and other fields. This epitaxial wafer carrier refers to the deposition of TaC thin film on the substrate during the crystal growth process to form a wafer with specific structure and performance for subsequent device preparation.
Chemical vapor deposition (CVD) technology is usually used to prepare TaC coated epitaxial wafer carriers. By reacting metal organic precursors and carbon source gases at high temperature, a TaC film can be deposited on the surface of the crystal substrate. This film can have excellent electrical, optical and mechanical properties and is suitable for the preparation of various high-performance devices.
Semicera provides specialized tantalum carbide (TaC) coatings for various components and carriers. Semicera leading coating process enables tantalum carbide (TaC) coatings to achieve high purity, high temperature stability and high chemical tolerance, improving product quality of SIC/GAN crystals and EPI layers (Graphite coated TaC susceptor), and extending the life of key reactor components. The use of tantalum carbide TaC coating is to solve the edge problem and improve the quality of crystal growth, and Semicera has breakthrough solved the tantalum carbide coating technology (CVD), reaching the international advanced level.
After years of development, Semicera has conquered the technology of CVD TaC with the joint efforts of the R&D department. Defects are easy to occur in the growth process of SiC wafers, but after using TaC, the difference is significant. Below is a comparison of wafers with and without TaC, as well as Simicera’ parts for single crystal growth.
Moreover, Semicera’s TaC-coated products exhibit a longer service life and greater high-temperature resistance compared to SiC coatings. Laboratory measurements have demonstrated that our TaC coatings can consistently perform at temperatures up to 2300 degrees Celsius for extended periods. Below are some examples of our samples:
