{"id":1398,"date":"2025-09-11T05:28:53","date_gmt":"2025-09-11T05:28:53","guid":{"rendered":"https:\/\/weitai2.globaldeepsea.site\/product\/850v-high-power-gan-on-si-epi-wafer\/"},"modified":"2026-04-29T15:33:45","modified_gmt":"2026-04-29T07:33:45","slug":"850v-high-power-gan-on-si-epi-wafer","status":"publish","type":"product","link":"https:\/\/www.cn-semiconductorparts.com\/de\/product\/850v-high-power-gan-on-si-epi-wafer\/","title":{"rendered":"850 V Hochleistungs-Gan-on-Si-Epi-Wafer"},"content":{"rendered":"<div class=\"fl-builder-content fl-builder-content-10225 fl-builder-content-primary fl-builder-global-templates-locked\" data-post-id=\"10225\">\n<div class=\"fl-row fl-row-full-width fl-row-bg-none fl-node-66c2ecc10de25\" data-node=\"66c2ecc10de25\">\n<div class=\"fl-row-content-wrap\">\n<div class=\"fl-row-content fl-row-full-width fl-node-content\">\n<div class=\"fl-col-group fl-node-66c2ecc10de68\" data-node=\"66c2ecc10de68\">\n<div class=\"fl-col fl-node-66c2ecc10dea8\" data-node=\"66c2ecc10dea8\" style=\"width: 100%;\">\n<div class=\"fl-col-content fl-node-content\">\n<div class=\"fl-module fl-module-rich-text fl-node-66c2ecc10dee8\" data-animation-delay=\"0.0\" data-node=\"66c2ecc10dee8\">\n<div class=\"fl-module-content fl-node-content\">\n<div class=\"fl-rich-text\">\n<p><span style=\"font-family: arial, helvetica, sans-serif; font-size: medium;\"><em>Semizelle<\/em> introduces the <strong>850 V Hochleistungs-Gan-on-Si-Epi-Wafer<\/strong>, a breakthrough in semiconductor innovation. This advanced epi wafer combines the high efficiency of Gallium Nitride (GaN) with the cost-effectiveness of Silicon (Si), creating a powerful solution for high-voltage applications.<\/span><\/p>\n<p><strong><span style=\"font-family: arial, helvetica, sans-serif; font-size: medium;\">Schl\u00fcsselmerkmale:<\/span><\/strong><\/p>\n<p><span style=\"font-family: arial, helvetica, sans-serif; font-size: medium;\">\u00a0 \u00a0 \u00a0\u2022\u00a0<\/span><span style=\"font-family: arial, helvetica, sans-serif; font-size: medium;\"><strong>High Voltage Handling<\/strong>: Engineered to support up to 850V, this GaN-on-Si Epi Wafer is ideal for demanding power electronics, enabling higher efficiency and performance.<\/span><\/p>\n<p><span style=\"font-family: arial, helvetica, sans-serif; font-size: medium;\">\u00a0 \u00a0 \u00a0\u2022\u00a0<\/span><span style=\"font-family: arial, helvetica, sans-serif; font-size: medium;\"><strong>Enhanced Power Density<\/strong>: With superior electron mobility and thermal conductivity, GaN technology allows for compact designs and increased power density.<\/span><\/p>\n<p><span style=\"font-family: arial, helvetica, sans-serif; font-size: medium;\">\u00a0 \u00a0 \u00a0\u2022\u00a0<\/span><span style=\"font-family: arial, helvetica, sans-serif; font-size: medium;\"><strong>Cost-Effective Solution<\/strong>: By leveraging silicon as the substrate, this epi wafer offers a cost-effective alternative to traditional GaN wafers, without compromising on quality or performance.<\/span><\/p>\n<p><span style=\"font-family: arial, helvetica, sans-serif; font-size: medium;\">\u00a0 \u00a0 \u00a0\u2022\u00a0<\/span><span style=\"font-family: arial, helvetica, sans-serif; font-size: medium;\"><strong>Wide Application Range<\/strong>: Perfect for use in power converters, RF amplifiers, and other high-power electronic devices, ensuring reliability and durability.<\/span><\/p>\n<p><span style=\"font-family: arial, helvetica, sans-serif; font-size: medium;\">Explore the future of high-voltage technology with Semicera\u2019s <strong>850 V Hochleistungs-Gan-on-Si-Epi-Wafer<\/strong>. Designed for cutting-edge applications, this product ensures your electronic devices operate with maximum efficiency and reliability. Choose Semicera for your next-generation semiconductor needs.<\/span><\/p>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<div class=\"fl-col-group fl-node-66c2ecc10df27\" data-node=\"66c2ecc10df27\">\n<div class=\"fl-col fl-node-66c2ecc10df67\" data-node=\"66c2ecc10df67\" style=\"width: 100%;\">\n<div class=\"fl-col-content fl-node-content\">\n<div class=\"fl-module fl-module-rich-text fl-node-66c2ecc10dfa7\" data-animation-delay=\"0.0\" data-node=\"66c2ecc10dfa7\">\n<div class=\"fl-module-content fl-node-content\">\n<div class=\"fl-rich-text\">\n<table border=\"0\" cellspacing=\"0\">\n<tbody>\n<tr>\n<td>\n<p>Artikel<\/p>\n<\/td>\n<td>\n<p>Produktion<\/p>\n<\/td>\n<td>\n<p>Forschung<\/p>\n<\/td>\n<td>\n<p>Dummy<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td colspan=\"4\">\n<p style=\"text-align: center;\">Kristallparameter<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Polytype<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>4H<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Oberfl\u00e4chenorientierungsfehler<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>4\u00b10.15\u00b0<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td colspan=\"4\">\n<p style=\"text-align: center;\">Elektrische Parameter<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Dopant<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>Stickstoff vom Typ N<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Widerstand<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>0,015-0.025OHM \u00b7 cm<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td colspan=\"4\">\n<p style=\"text-align: center;\">Mechanische Parameter<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Durchmesser<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>150,0 \u00b1 0,2 mm<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Dicke<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>350 \u00b1 25 \u00b5m<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Prim\u00e4re flache Orientierung<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>[1-100]\u00b15\u00b0<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Prim\u00e4re flache L\u00e4nge<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>47,5 \u00b1 1,5 mm<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Sekund\u00e4re flache<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>Keiner<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Ttv<\/p>\n<\/td>\n<td>\n<p>\u22645 \u00b5m<\/p>\n<\/td>\n<td>\n<p>\u226410 \u00b5m<\/p>\n<\/td>\n<td>\n<p>\u226415 \u00b5m<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>LTV<\/p>\n<\/td>\n<td>\n<p>\u22643 \u03bcm (5 mm*5 mm)<\/p>\n<\/td>\n<td>\n<p>\u22645 \u03bcm (5 mm*5 mm)<\/p>\n<\/td>\n<td>\n<p>\u226410 \u03bcm (5 mm*5 mm)<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Bogen<\/p>\n<\/td>\n<td>\n<p>-15 \u03bcm ~ 15 \u03bcm<\/p>\n<\/td>\n<td>\n<p>-35 \u03bcm ~ 35 \u03bcm<\/p>\n<\/td>\n<td>\n<p>-45 \u03bcm ~ 45 \u03bcm<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Kette<\/p>\n<\/td>\n<td>\n<p>\u226435 \u00b5m<\/p>\n<\/td>\n<td>\n<p>\u226445 \u00b5m<\/p>\n<\/td>\n<td>\n<p>\u226455 \u00b5m<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Front (Si-Face) Rauheit (AFM)<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>Ra \u2264 0,2 nm (5 &amp; mgr; m*5 \u03bcm)<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td colspan=\"4\">\n<p style=\"text-align: center;\">Struktur<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Mikropipe -Dichte<\/p>\n<\/td>\n<td>\n<p>&lt;1 EA\/CM2<\/p>\n<\/td>\n<td>\n<p>&lt;10 EA\/CM2<\/p>\n<\/td>\n<td>\n<p>&lt;15 EA\/CM2<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Metallverunreinigungen<\/p>\n<\/td>\n<td colspan=\"2\">\n<p>\u22645E10atoms\/cm2<\/p>\n<\/td>\n<td>\n<p>N \/ A<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>BPD<\/p>\n<\/td>\n<td>\n<p>\u22641500 EA\/CM2<\/p>\n<\/td>\n<td>\n<p>\u22643000 EA\/CM2<\/p>\n<\/td>\n<td>\n<p>N \/ A<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>TSD<\/p>\n<\/td>\n<td>\n<p>\u2264500 EA\/CM2<\/p>\n<\/td>\n<td>\n<p>\u22641000 EA\/CM2<\/p>\n<\/td>\n<td>\n<p>N \/ A<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td colspan=\"4\">\n<p style=\"text-align: center;\">Frontqualit\u00e4t<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Front<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>Si<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Oberfl\u00e4chenbeschaffung<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>Si-Face CMP<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Partikel<\/p>\n<\/td>\n<td>\n<p>\u226460ea\/Wafer (Gr\u00f6\u00dfe \u2265 0,3 \u03bcm)<\/p>\n<\/td>\n<td colspan=\"2\">\n<p>N \/ A<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Kratzer<\/p>\n<\/td>\n<td>\n<p>\u22645ea\/mm. Kumulative L\u00e4nge \u2264 Diameter<\/p>\n<\/td>\n<td>\n<p>Kumulative L\u00e4nge \u2264 2*Durchmesser<\/p>\n<\/td>\n<td>\n<p>N \/ A<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Orangenschale\/Pits\/Flecken\/Streifen\/Risse\/Kontamination<\/p>\n<\/td>\n<td colspan=\"2\">\n<p>Keiner<\/p>\n<\/td>\n<td>\n<p>N \/ A<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Kantenchips\/Eingeweide\/Fraktur-\/Sechskantplatten<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>Keiner<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Polytyperbereiche<\/p>\n<\/td>\n<td>\n<p>Keiner<\/p>\n<\/td>\n<td>\n<p>Kumulative Fl\u00e4che \u2264 2010TP3T<\/p>\n<\/td>\n<td>\n<p>Kumulative Fl\u00e4che \u2264 30%<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Frontlasermarkierung<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>Keiner<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td colspan=\"4\">\n<p style=\"text-align: center;\">R\u00fcckenqualit\u00e4t<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>R\u00fcckbeschluss<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>C-Face CMP<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Kratzer<\/p>\n<\/td>\n<td>\n<p>\u22645ea\/mm, kumulative L\u00e4nge \u2264 2*Durchmesser<\/p>\n<\/td>\n<td colspan=\"2\">\n<p>N \/ A<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>R\u00fcckenfehler (Kantenchips\/Eingebiete)<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>Keiner<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>R\u00fcckenrauheit<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>Ra \u2264 0,2 nm (5 &amp; mgr; m*5 \u03bcm)<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>R\u00fcckmarkierung von Laser<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>1 mm (von der Oberkante)<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td colspan=\"4\">\n<p style=\"text-align: center;\">Rand<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Rand<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>Chamfer<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td colspan=\"4\">\n<p style=\"text-align: center;\">Packaging<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Packaging<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>Epi-ready with vacuum packaging<\/p>\n<p>Multi-wafer cassette packaging<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td colspan=\"4\">\n<p style=\"text-align: center;\">*Notes\uff1a \u201cNA\u201d means no request Items not mentioned may refer to SEMI-STD.<\/p>\n<\/td>\n<\/tr>\n<\/tbody>\n<\/table><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<div class=\"fl-col-group fl-node-66c2ecc10e0a5\" data-node=\"66c2ecc10e0a5\">\n<div class=\"fl-col fl-node-66c2ecc10e0e5\" data-node=\"66c2ecc10e0e5\" style=\"width: 100%;\">\n<div class=\"fl-col-content fl-node-content\">\n<div class=\"fl-module fl-module-photo fl-node-66c2ecc10e124\" data-animation-delay=\"0.0\" data-node=\"66c2ecc10e124\">\n<div class=\"fl-module-content fl-node-content\">\n<div class=\"fl-photo fl-photo-align-center\" itemscope=\"\" itemtype=\"http:\/\/schema.org\/ImageObject\">\n<div class=\"fl-photo-content fl-photo-img-png\"> <img decoding=\"async\" alt=\"tech_1_2_size\" class=\"fl-photo-img wp-image-2173\" itemprop=\"image\" src=\"\/wp-content\/uploads\/2025\/09\/e3ee0b4147c636ee.webp\"> <\/img><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<div class=\"fl-col-group fl-node-66c2ecc10dfe6\" data-node=\"66c2ecc10dfe6\">\n<div class=\"fl-col fl-node-66c2ecc10e026\" data-node=\"66c2ecc10e026\" style=\"width: 100%;\">\n<div class=\"fl-col-content fl-node-content\">\n<div class=\"fl-module fl-module-photo fl-node-66c2ecc10e066\" data-animation-delay=\"0.0\" data-node=\"66c2ecc10e066\">\n<div class=\"fl-module-content fl-node-content\">\n<div class=\"fl-photo fl-photo-align-center\" itemscope=\"\" itemtype=\"http:\/\/schema.org\/ImageObject\">\n<div class=\"fl-photo-content fl-photo-img-jpg\"> <img decoding=\"async\" alt=\"SiC wafers\" class=\"fl-photo-img wp-image-2174\" itemprop=\"image\" src=\"\/wp-content\/uploads\/2025\/09\/4530d9462eb0bb0b.webp\"> <\/img><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/div>","protected":false},"excerpt":{"rendered":"<p>850V High Power GaN-on-Si Epi Wafer\u2013 Discover the next generation of semiconductor technology with Semicera\u2019s 850V High Power GaN-on-Si Epi Wafer, designed for superior performance and efficiency in high-voltage applications.<\/p>","protected":false},"featured_media":835,"comment_status":"closed","ping_status":"open","template":"","meta":[],"product_brand":[],"product_cat":[54,26],"product_tag":[],"class_list":{"0":"post-1398","1":"product","2":"type-product","3":"status-publish","4":"has-post-thumbnail","6":"product_cat-gallium-oxide-ga203","7":"product_cat-wafer","9":"first","10":"instock","11":"product-type-simple"},"_links":{"self":[{"href":"https:\/\/www.cn-semiconductorparts.com\/de\/wp-json\/wp\/v2\/product\/1398","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.cn-semiconductorparts.com\/de\/wp-json\/wp\/v2\/product"}],"about":[{"href":"https:\/\/www.cn-semiconductorparts.com\/de\/wp-json\/wp\/v2\/types\/product"}],"replies":[{"embeddable":true,"href":"https:\/\/www.cn-semiconductorparts.com\/de\/wp-json\/wp\/v2\/comments?post=1398"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/www.cn-semiconductorparts.com\/de\/wp-json\/wp\/v2\/media\/835"}],"wp:attachment":[{"href":"https:\/\/www.cn-semiconductorparts.com\/de\/wp-json\/wp\/v2\/media?parent=1398"}],"wp:term":[{"taxonomy":"product_brand","embeddable":true,"href":"https:\/\/www.cn-semiconductorparts.com\/de\/wp-json\/wp\/v2\/product_brand?post=1398"},{"taxonomy":"product_cat","embeddable":true,"href":"https:\/\/www.cn-semiconductorparts.com\/de\/wp-json\/wp\/v2\/product_cat?post=1398"},{"taxonomy":"product_tag","embeddable":true,"href":"https:\/\/www.cn-semiconductorparts.com\/de\/wp-json\/wp\/v2\/product_tag?post=1398"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}