Semicera’s PSS Processing Carrier for Semiconductor Wafer Transmission is engineered for efficient handling and transfer of semiconductor wafers during manufacturing processes. Made from high-quality materials, this carrier ensures precise alignment, minimal contamination, and smooth wafer transport. Designed for the semiconductor industry, Semicera’s PSS carriers enhance process efficiency, reliability, and yield, making them an essential component in wafer processing and handling applications.
Product Description
Our company provides SiC coating process services by CVD method on the surface of graphite, ceramics and other materials, so that special gases containing carbon and silicon react at high temperature to obtain high purity SiC molecules, molecules deposited on the surface of the coated materials, forming SIC protective layer.
Main features:
1. High temperature oxidation resistance:
the oxidation resistance is still very good when the temperature is as high as 1600 C.
2. High purity : made by chemical vapor deposition under high temperature chlorination condition.
3. Erosion resistance: high hardness, compact surface, fine particles.
4. Corrosion resistance: acid, alkali, salt and organic reagents.
Main Specifications of CVD-SIC Coating
|
SiC-CVD Properties |
||
|
Crystal Structure |
FCC β phase |
|
|
Density |
g/cm ³ |
3.21 |
|
Hardness |
Vickers hardness |
2500 |
|
Grain Size |
μm |
2~10 |
|
Chemical Purity |
% |
99.99995 |
|
Heat Capacity |
J·kg-1 ·K-1 |
640 |
|
Sublimation Temperature |
℃ |
2700 |
|
Felexural Strength |
MPa (RT 4-point) |
415 |
|
Young’ s Modulus |
Gpa (4pt bend, 1300℃) |
430 |
|
Thermal Expansion (C.T.E) |
10-6K-1 |
4.5 |
|
Thermal conductivity |
(W/mK) |
300 |
