3C-SiC Wafer Substrate

Semicera 3C-SiC Wafer Substrates offer superior thermal conductivity and high electrical breakdown voltage, ideal for power electronic and high-frequency devices. These substrates are precision-engineered for optimal performance in harsh environments, ensuring reliability and efficiency. Choose Semicera for innovative and advanced solutions.

Semicera 3C-SiC Wafer Substrates are engineered to provide a robust platform for next-generation power electronics and high-frequency devices. With superior thermal properties and electrical characteristics, these substrates are designed to meet the demanding requirements of modern technology.

The 3C-SiC (Cubic Silicon Carbide) structure of Semicera Wafer Substrates offers unique advantages, including higher thermal conductivity and a lower thermal expansion coefficient compared to other semiconductor materials. This makes them an excellent choice for devices operating under extreme temperatures and high-power conditions.

With a high electrical breakdown voltage and superior chemical stability, Semicera 3C-SiC Wafer Substrates ensure long-lasting performance and reliability. These properties are critical for applications such as high-frequency radar, solid-state lighting, and power inverters, where efficiency and durability are paramount.

Semicera’s commitment to quality is reflected in the meticulous manufacturing process of their 3C-SiC Wafer Substrates, ensuring uniformity and consistency across every batch. This precision contributes to the overall performance and longevity of the electronic devices built upon them.

By choosing Semicera 3C-SiC Wafer Substrates, manufacturers gain access to a cutting-edge material that enables the development of smaller, faster, and more efficient electronic components. Semicera continues to support technological innovation by providing reliable solutions that meet the evolving demands of the semiconductor industry.

Elementos

Producción

Investigación

Ficticio

Parámetros de cristal

Politito

4H

Error de orientación de la superficie

4±0.15°

Parámetros eléctricos

Dopante

nitrógeno de tipo N

Resistividad

0.015-0.025ohm · cm

Parámetros mecánicos

Diámetro

150.0 ± 0.2 mm

Espesor

350 ± 25 µm

Orientación plana primaria

[1-100]±5°

Longitud plana primaria

47.5 ± 1.5 mm

Plano secundario

Ninguno

TTV

≤5 µm

≤10 µm

≤15 µm

LTV

≤3 μm (5 mm*5 mm)

≤5 μm (5 mm*5 mm)

≤10 μm (5 mm*5 mm)

Arco

-15 μm ~ 15 μm

-35 μm ~ 35 μm

-45 μm ~ 45 μm

Urdimbre

≤35 µm

≤45 µm

≤55 µm

Rugosidad delantera (SI-FACE) (AFM)

RA≤0.2Nm (5 μm*5 μm)

Estructura

Densidad de micropipe

<1 ea/cm2

<10 ea/cm2

<15 ea/cm2

Impurezas de metal

≤5E10atoms/cm2

N / A

BPD

≤1500 ea/cm2

≤3000 ea/cm2

N / A

TSD

≤500 ea/cm2

≤1000 ea/cm2

N / A

Calidad frontal

Frente

Si

Acabado superficial

SI-FACE CMP

Partículas

≤60ea/oblea (tamaño ≥0.3 μm)

N / A

Arañazos

≤5ea/mm. Longitud acumulativa ≤diameter

Longitud acumulativa ≤2*diámetro

N / A

Peel de naranja/pits/manchas/estrías/grietas/contaminación

Ninguno

N / A

Chips de borde/sangría/placas hexagonales

Ninguno

Áreas de politype

Ninguno

Área acumulada ≤20%

Área acumulada ≤30%

Marcado láser delantero

Ninguno

Calidad espalda

Final

CMP C-FACE

Arañazos

≤5EA/mm, longitud acumulativa ≤2*diámetro

N / A

Defectos posteriores (chips/muescas de borde)

Ninguno

Rugosidad

RA≤0.2Nm (5 μm*5 μm)

Marcado láser de espalda

1 mm (desde el borde superior)

Borde

Borde

Chaflán

Embalaje

Embalaje

Lista de EPI con embalaje de vacío

Embalaje de cassette de múltiples obras

*Notas: "NA" significa que ningún elemento de solicitud no mencionado puede referirse a SEMI-STD.

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