{"id":2223,"date":"2025-09-11T05:33:27","date_gmt":"2025-09-11T05:33:27","guid":{"rendered":"https:\/\/weitai2.globaldeepsea.site\/product\/sic-pin-trays-for-icp-etching-processes-in-the-led-industry\/"},"modified":"2026-04-29T15:28:11","modified_gmt":"2026-04-29T07:28:11","slug":"sic-pin-trays-for-icp-etching-processes-in-the-led-industry","status":"publish","type":"product","link":"https:\/\/www.cn-semiconductorparts.com\/es\/product\/sic-pin-trays-for-icp-etching-processes-in-the-led-industry\/","title":{"rendered":"SiC Pin Trays for ICP Etching Processes in the LED Industry"},"content":{"rendered":"
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Descripci\u00f3n del Producto<\/p>\n

Nuestra compa\u00f1\u00eda proporciona servicios de procesos de recubrimiento SIC mediante el m\u00e9todo de CVD en la superficie del grafito, la cer\u00e1mica y otros materiales, de modo que los gases especiales que contienen carbono y silicio reaccionan a alta temperatura para obtener mol\u00e9culas SiC de alta pureza, mol\u00e9culas depositadas en la superficie de los materiales recubiertos, formando una capa protectora SIC.<\/p>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n

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Caracter\u00edsticas principales:<\/p>\n

1. Resistencia a la oxidaci\u00f3n de alta temperatura:<\/p>\n

La resistencia a la oxidaci\u00f3n sigue siendo muy buena cuando la temperatura es tan alta como 1600 C.<\/p>\n

2. Alta pureza: hecha por deposici\u00f3n de vapor qu\u00edmico en una condici\u00f3n de cloraci\u00f3n de alta temperatura.<\/p>\n

3. Resistencia a la erosi\u00f3n: alta dureza, superficie compacta, part\u00edculas finas.<\/p>\n

4. Resistencia a la corrosi\u00f3n: \u00e1cido, \u00e1lcali, sal y reactivos org\u00e1nicos.<\/p>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n

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\"Silicon <\/img><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n
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Especificaciones principales de recubrimiento CVD-SIC<\/p>\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n
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Propiedades de SIC-CVD<\/p>\n<\/td>\n<\/tr>\n

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Estructura cristalina<\/p>\n<\/td>\n

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Fase FCC \u03b2<\/p>\n<\/td>\n<\/tr>\n

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Densidad<\/p>\n<\/td>\n

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g\/cm \u00b3<\/p>\n<\/td>\n

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3.21<\/p>\n<\/td>\n<\/tr>\n

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Dureza<\/p>\n<\/td>\n

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Dureza de Vickers<\/p>\n<\/td>\n

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2500<\/p>\n<\/td>\n<\/tr>\n

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Tama\u00f1o de grano<\/p>\n<\/td>\n

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mm<\/p>\n<\/td>\n

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2~10<\/p>\n<\/td>\n<\/tr>\n

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Pureza qu\u00edmica<\/p>\n<\/td>\n

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%<\/p>\n<\/td>\n

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99.99995<\/p>\n<\/td>\n<\/tr>\n

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Capacidad de calor<\/p>\n<\/td>\n

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J \u00b7 KG-1 \u00b7 K-1<\/p>\n<\/td>\n

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640<\/p>\n<\/td>\n<\/tr>\n

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Temperatura de sublimaci\u00f3n<\/p>\n<\/td>\n

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\u2103<\/p>\n<\/td>\n

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2700<\/p>\n<\/td>\n<\/tr>\n

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Fuerza del felexural<\/p>\n<\/td>\n

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MPA (RT 4 puntos)<\/p>\n<\/td>\n

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415<\/p>\n<\/td>\n<\/tr>\n

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M\u00f3dulo de Young<\/p>\n<\/td>\n

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GPA (4pt Bend, 1300 \u2103)<\/p>\n<\/td>\n

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430<\/p>\n<\/td>\n<\/tr>\n

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Expansi\u00f3n t\u00e9rmica (CTE)<\/p>\n<\/td>\n

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10-6K-1<\/p>\n<\/td>\n

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4.5<\/p>\n<\/td>\n<\/tr>\n

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Conductividad t\u00e9rmica<\/p>\n<\/td>\n

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(W\/mk)<\/p>\n<\/td>\n

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300<\/p>\n<\/td>\n<\/tr>\n<\/tbody>\n<\/table><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n

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\"Imagen <\/img><\/a> <\/div>\n<\/p><\/div>\n<\/p><\/div>\n
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\"csm_SGL-Smartere-Welt-St-Marys-erleuchtet-die-Welt_199f49f434\" <\/img><\/a> <\/div>\n<\/p><\/div>\n<\/p><\/div>\n
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\"CVD\" <\/img><\/a> <\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n
<\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n
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\"Lugar <\/img><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n
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\"Semicera <\/img><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n
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\"M\u00e1quina <\/img><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n
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\"Procesamiento <\/img><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n
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\"Nuestro <\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/div>","protected":false},"excerpt":{"rendered":"

Semicera\u2019s SiC Pin Trays for ICP Etching Processes in the LED Industry are specifically designed to enhance efficiency and precision in etching applications. Made from high-quality silicon carbide, these pin trays offer excellent thermal stability, chemical resistance, and mechanical strength. Ideal for the demanding conditions of the LED manufacturing process, Semicera\u2019s SiC pin trays ensure uniform etching, minimize contamination, and improve overall process reliability, contributing to high-quality LED production.<\/p>","protected":false},"featured_media":704,"comment_status":"closed","ping_status":"open","template":"","meta":[],"product_brand":[],"product_cat":[31,40],"product_tag":[],"class_list":{"0":"post-2223","1":"product","2":"type-product","3":"status-publish","4":"has-post-thumbnail","6":"product_cat-more-ceramic-products","7":"product_cat-more-products","9":"first","10":"instock","11":"product-type-simple"},"_links":{"self":[{"href":"https:\/\/www.cn-semiconductorparts.com\/es\/wp-json\/wp\/v2\/product\/2223","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.cn-semiconductorparts.com\/es\/wp-json\/wp\/v2\/product"}],"about":[{"href":"https:\/\/www.cn-semiconductorparts.com\/es\/wp-json\/wp\/v2\/types\/product"}],"replies":[{"embeddable":true,"href":"https:\/\/www.cn-semiconductorparts.com\/es\/wp-json\/wp\/v2\/comments?post=2223"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/www.cn-semiconductorparts.com\/es\/wp-json\/wp\/v2\/media\/704"}],"wp:attachment":[{"href":"https:\/\/www.cn-semiconductorparts.com\/es\/wp-json\/wp\/v2\/media?parent=2223"}],"wp:term":[{"taxonomy":"product_brand","embeddable":true,"href":"https:\/\/www.cn-semiconductorparts.com\/es\/wp-json\/wp\/v2\/product_brand?post=2223"},{"taxonomy":"product_cat","embeddable":true,"href":"https:\/\/www.cn-semiconductorparts.com\/es\/wp-json\/wp\/v2\/product_cat?post=2223"},{"taxonomy":"product_tag","embeddable":true,"href":"https:\/\/www.cn-semiconductorparts.com\/es\/wp-json\/wp\/v2\/product_tag?post=2223"}],"curies":[{"name":"WP","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}