Feature

Semicera Semiconductor Technology Co., Ltd., based in Ningbo, Zhejiang Province, China, was established in January 2018. Our mission is to shape the future through materials, and our vision is to become a leading new materials company with core technologies in the semiconductor field. We specialize in the research and development of advanced technologies such as SiC coatings, Tac coatings, pyrolytic carbon coatings, CVD SiC (Solid SiC), and recrystallized silicon carbide, which are critical for the semiconductor industry. We also focus on the large-scale production of high-purity material products.

Honor and Certification

Facilities and Laboratories

CVD high temperature furnace

Coating substrates for LED chip epitaxy, silicon wafer epitaxy, third-generation semiconductor epitaxy substrates and components, TaC coatings, and more.

Vacuum purification furnace

Purification of carbon-based elements such as graphite, carbon felt, graphite powder, and carbon composite.

Horizontal graphitization furnace

Primarily employed for high-temperature treatment of carbon materials, such as sintering and graphitization of carbon materials, graphitization of PI film, sintering of thermal conductive materials, sintering and graphitization of carbon fiber ropes, graphitization of carbon fiber filaments, purification of graphite powder, and other materials suitable for carbon environment graphitization.