CVD SiC Coated Wafer Susceptor for Deep UV-LED Production

Semicera Energy Technology Co., Ltd. is a supplier of advanced semiconductor ceramic components. Our main products include silicon carbide etched discs, silicon carbide boat carriers, silicon carbide wafer carriers (PV & semiconductor), silicon carbide furnace tubes, silicon carbide cantilever paddles, silicon carbide chucks, silicon carbide beams, as well as CVD SiC coatings and TaC coatings.

These products are widely used in the semiconductor and photovoltaic industries, including crystal growth, epitaxy, etching, packaging, coating, and diffusion furnace equipment applications.

Description

Semicera provides CVD SiC coating services on graphite, ceramics, and other substrate materials. In the process, silicon- and carbon-containing precursor gases react at high temperature to form high-purity SiC species, which are deposited onto the surface of the substrate to create a dense and uniform SiC protective layer.

6                  UV-LED-1         

UV-LED-2

Caractéristiques principales

1. High temperature oxidation resistance: the oxidation resistance is still very good when the temperature is as high as 1600 C.
2. High purity: made by chemical vapor deposition under high-temperature chlorination conditions.
3. Résistance à l'érosion: dureté élevée, surface compacte, particules fines.
4. Corrosion resistance: acid, alkali, salt, and organic reagents.

Spécifications principales du revêtement CVD-SIC

Propriétés SIC-CVD
Structure cristalline Phase FCC β
Densité g / cm ³ 3.21
Dureté Vickers dureté 2500
Taille des grains MM 2~10
Pureté chimique % 99.99995
Capacité thermique J · kg-1 · k-1 640
Température de sublimation 2700
Résistance aux félexes MPA (RT 4 points) 415
Young’s modulus GPA (4pt Bend, 1300 ℃) 430
Expansion thermique (CTE) 10-6K-1 4.5
Conductivité thermique (W / mk) 300

Lieu de travail Semiera 

Semirara Lieu de travail 2
Machine de matériel
Traitement CNN, nettoyage chimique, revêtement CVD
Notre service

 

 

 

 

 

 

 

 

 

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