{"id":1334,"date":"2025-09-11T05:28:33","date_gmt":"2025-09-11T05:28:33","guid":{"rendered":"https:\/\/weitai2.globaldeepsea.site\/product\/silicon-on-insulator-wafers\/"},"modified":"2025-09-24T16:03:58","modified_gmt":"2025-09-24T08:03:58","slug":"silicon-on-insulator-wafers","status":"publish","type":"product","link":"https:\/\/www.cn-semiconductorparts.com\/fr\/product\/silicon-on-insulator-wafers\/","title":{"rendered":"Silicon sur les plaquettes d'isolateur"},"content":{"rendered":"<p><?xml encoding=\"utf-8\" ?><\/p>\n<div class=\"fl-builder-content fl-builder-content-11254 fl-builder-content-primary fl-builder-global-templates-locked\" data-post-id=\"11254\">\n<div class=\"fl-row fl-row-full-width fl-row-bg-none fl-node-670e40bd06941\" data-node=\"670e40bd06941\">\n<div class=\"fl-row-content-wrap\">\n<div class=\"fl-row-content fl-row-full-width fl-node-content\">\n<div class=\"fl-col-group fl-node-670e40bd06986\" data-node=\"670e40bd06986\">\n<div class=\"fl-col fl-node-670e40bd069cb\" data-node=\"670e40bd069cb\" style=\"width: 100%;\">\n<div class=\"fl-col-content fl-node-content\">\n<div class=\"fl-module fl-module-rich-text fl-node-670e40bd06a0d\" data-animation-delay=\"0.0\" data-node=\"670e40bd06a0d\">\n<div class=\"fl-module-content fl-node-content\">\n<div class=\"fl-rich-text\">\n<p><span style=\"font-family: arial, helvetica, sans-serif; font-size: medium;\">Silicon on Insulator Wafers from Semicera are designed to meet the growing demand for high-performance semiconductor solutions. Our SOI wafers offer superior electrical performance and reduced parasitic device capacitance, making them ideal for advanced applications such as MEMS devices, sensors, and integrated circuits. Semicera&rsquo;s expertise in wafer production ensures that each SOI wafer provides reliable, high-quality results for your next-generation technology needs.<\/span><\/p>\n<p><span style=\"font-family: arial, helvetica, sans-serif; font-size: medium;\">Our Silicon on Insulator Wafers offer an optimal balance between cost-effectiveness and performance. With soi wafer cost becoming increasingly competitive, these wafers are widely used in a range of industries, including microelectronics and optoelectronics. Semicera&#8217;s high-precision production process guarantees superior wafer bonding and uniformity, making them suitable for a variety of applications, from cavity SOI wafers to standard silicon wafers.<\/span><\/p>\n<p><strong><span style=\"font-family: arial, helvetica, sans-serif; font-size: medium;\">Caract\u00e9ristiques cl\u00e9s:<\/span><\/strong><\/p>\n<p><span style=\"font-family: arial, helvetica, sans-serif; font-size: medium;\">&nbsp; &nbsp; &nbsp; &nbsp;&bull;&nbsp;&nbsp;<\/span><span style=\"font-family: arial, helvetica, sans-serif; font-size: medium;\">High-quality SOI wafers optimized for performance in MEMS and other applications.<\/span><\/p>\n<p><span style=\"font-family: arial, helvetica, sans-serif; font-size: medium;\">&nbsp; &nbsp; &nbsp; &nbsp;&bull;&nbsp;&nbsp;<\/span><span style=\"font-family: arial, helvetica, sans-serif; font-size: medium;\">Competitive soi wafer cost for businesses seeking advanced solutions without compromising quality.<\/span><\/p>\n<p><span style=\"font-family: arial, helvetica, sans-serif; font-size: medium;\">&nbsp; &nbsp; &nbsp; &nbsp;&bull;&nbsp;&nbsp;<\/span><span style=\"font-family: arial, helvetica, sans-serif; font-size: medium;\">Ideal for cutting-edge technologies, offering enhanced electrical isolation and efficiency in silicon on insulator systems.<\/span><\/p>\n<p><span style=\"font-family: arial, helvetica, sans-serif; font-size: medium;\">Our Silicon on Insulator Wafers are engineered to provide high-performance solutions, supporting the next wave of innovation in semiconductor technology. Whether you&#8217;re working on cavity SOI wafers, MEMS devices, or silicon on insulator components, Semicera delivers wafers that meet the highest standards in the industry.<\/span><\/p>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<div class=\"fl-col-group fl-node-670e40bd06a50\" data-node=\"670e40bd06a50\">\n<div class=\"fl-col fl-node-670e40bd06a93\" data-node=\"670e40bd06a93\" style=\"width: 100%;\">\n<div class=\"fl-col-content fl-node-content\">\n<div class=\"fl-module fl-module-rich-text fl-node-670e40bd06ad5\" data-animation-delay=\"0.0\" data-node=\"670e40bd06ad5\">\n<div class=\"fl-module-content fl-node-content\">\n<div class=\"fl-rich-text\">\n<table border=\"0\" cellspacing=\"0\">\n<tbody>\n<tr>\n<td>\n<p>Articles<\/p>\n<\/td>\n<td>\n<p>Production<\/p>\n<\/td>\n<td>\n<p>Recherche<\/p>\n<\/td>\n<td>\n<p>Factice<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td colspan=\"4\">\n<p style=\"text-align: center;\">Param\u00e8tres de cristal<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Polytype<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>4H<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Erreur d'orientation de la surface<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>&lt;11-20 &gt;4&plusmn;0.15&deg;<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td colspan=\"4\">\n<p style=\"text-align: center;\">Param\u00e8tres \u00e9lectriques<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Dopant<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>azote de type N<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>R\u00e9sistivit\u00e9<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>0.015-0.025ohm&middot;cm<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td colspan=\"4\">\n<p style=\"text-align: center;\">Param\u00e8tres m\u00e9caniques<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Diam\u00e8tre<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>150.0&plusmn;0.2mm<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>\u00c9paisseur<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>350&plusmn;25 &mu;m<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Orientation plate primaire<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>[1-100]&plusmn;5&deg;<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Longueur plate primaire<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>47.5&plusmn;1.5mm<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Plat secondaire<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>Aucun<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>TTV<\/p>\n<\/td>\n<td>\n<p>&le;5 &mu;m<\/p>\n<\/td>\n<td>\n<p>&le;10 &mu;m<\/p>\n<\/td>\n<td>\n<p>&le;15 &mu;m<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>LTV<\/p>\n<\/td>\n<td>\n<p>&le;3 &mu;m(5mm*5mm)<\/p>\n<\/td>\n<td>\n<p>&le;5 &mu;m(5mm*5mm)<\/p>\n<\/td>\n<td>\n<p>&le;10 &mu;m(5mm*5mm)<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Arc<\/p>\n<\/td>\n<td>\n<p>-15&mu;m ~ 15&mu;m<\/p>\n<\/td>\n<td>\n<p>-35&mu;m ~ 35&mu;m<\/p>\n<\/td>\n<td>\n<p>-45&mu;m ~ 45&mu;m<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Cha\u00eene<\/p>\n<\/td>\n<td>\n<p>&le;35 &mu;m<\/p>\n<\/td>\n<td>\n<p>&le;45 &mu;m<\/p>\n<\/td>\n<td>\n<p>&le;55 &mu;m<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Rugosit\u00e9 avant (si-face) (AFM)<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>Ra&le;0.2nm (5&mu;m*5&mu;m)<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td colspan=\"4\">\n<p style=\"text-align: center;\">Structure<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Densit\u00e9 de micro-<\/p>\n<\/td>\n<td>\n<p>&lt;1 ea \/ cm2<\/p>\n<\/td>\n<td>\n<p>&lt;10 ea \/ cm2<\/p>\n<\/td>\n<td>\n<p>&lt;15 ea \/ cm2<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Impuret\u00e9s m\u00e9talliques<\/p>\n<\/td>\n<td colspan=\"2\">\n<p>&le;5E10atoms\/cm2<\/p>\n<\/td>\n<td>\n<p>N \/ A<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>BPB<\/p>\n<\/td>\n<td>\n<p>&le;1500 ea\/cm2<\/p>\n<\/td>\n<td>\n<p>&le;3000 ea\/cm2<\/p>\n<\/td>\n<td>\n<p>N \/ A<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>TSD<\/p>\n<\/td>\n<td>\n<p>&le;500 ea\/cm2<\/p>\n<\/td>\n<td>\n<p>&le;1000 ea\/cm2<\/p>\n<\/td>\n<td>\n<p>N \/ A<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td colspan=\"4\">\n<p style=\"text-align: center;\">Qualit\u00e9 avant<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Devant<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>Si<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Finition de surface<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>CMP SI-FACE<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Particules<\/p>\n<\/td>\n<td>\n<p>&le;60ea\/wafer (size&ge;0.3&mu;m)<\/p>\n<\/td>\n<td colspan=\"2\">\n<p>N \/ A<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Rayures<\/p>\n<\/td>\n<td>\n<p>&le;5ea\/mm. Cumulative length &le;Diameter<\/p>\n<\/td>\n<td>\n<p>Cumulative length&le;2*Diameter<\/p>\n<\/td>\n<td>\n<p>N \/ A<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>PELLE \/ PEPES ORANGE \/ TAPPES \/ COMMENTS \/ CRESCHES \/ CONTAMINATION<\/p>\n<\/td>\n<td colspan=\"2\">\n<p>Aucun<\/p>\n<\/td>\n<td>\n<p>N \/ A<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Coups de bord \/ retraits \/ fracture \/ plaques hexagonales<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>Aucun<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Zones de polytype<\/p>\n<\/td>\n<td>\n<p>Aucun<\/p>\n<\/td>\n<td>\n<p>Cumulative area&le;20%<\/p>\n<\/td>\n<td>\n<p>Cumulative area&le;30%<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Marquage laser avant<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>Aucun<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td colspan=\"4\">\n<p style=\"text-align: center;\">Qualit\u00e9 du dos<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Finition arri\u00e8re<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>CMP C-FACE<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Rayures<\/p>\n<\/td>\n<td>\n<p>&le;5ea\/mm,Cumulative length&le;2*Diameter<\/p>\n<\/td>\n<td colspan=\"2\">\n<p>N \/ A<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>D\u00e9fauts arri\u00e8re (puces de bord \/ retraits)<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>Aucun<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Rugosit\u00e9 du dos<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>Ra&le;0.2nm (5&mu;m*5&mu;m)<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Marquage laser arri\u00e8re<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>1 mm (du bord sup\u00e9rieur)<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td colspan=\"4\">\n<p style=\"text-align: center;\">Bord<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Bord<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>Chanfreiner<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td colspan=\"4\">\n<p style=\"text-align: center;\">Conditionnement<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td>\n<p>Conditionnement<\/p>\n<\/td>\n<td colspan=\"3\">\n<p>Pr\u00e9par\u00e9 en \u00e9pi avec un emballage sous vide<\/p>\n<p>Emballage de cassette multi-wafer<\/p>\n<\/td>\n<\/tr>\n<tr>\n<td colspan=\"4\">\n<p style=\"text-align: center;\">*Notes&#65306; &#8220;NA&#8221; means no request Items not mentioned may refer to SEMI-STD.<\/p>\n<\/td>\n<\/tr>\n<\/tbody>\n<\/table><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<div class=\"fl-col-group fl-node-670e40bd06bdf\" data-node=\"670e40bd06bdf\">\n<div class=\"fl-col fl-node-670e40bd06c21\" data-node=\"670e40bd06c21\" style=\"width: 100%;\">\n<div class=\"fl-col-content fl-node-content\">\n<div class=\"fl-module fl-module-photo fl-node-670e40bd06c64\" data-animation-delay=\"0.0\" data-node=\"670e40bd06c64\">\n<div class=\"fl-module-content fl-node-content\">\n<div class=\"fl-photo fl-photo-align-center\" itemscope=\"\" itemtype=\"http:\/\/schema.org\/ImageObject\">\n<div class=\"fl-photo-content fl-photo-img-png\"> <img decoding=\"async\" alt=\"tech_1_2_size\" class=\"fl-photo-img wp-image-2173\" itemprop=\"image\" src=\"\/wp-content\/uploads\/2025\/09\/e3ee0b4147c636ee.webp\"> <\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<div class=\"fl-col-group fl-node-670e40bd06b18\" data-node=\"670e40bd06b18\">\n<div class=\"fl-col fl-node-670e40bd06b5a\" data-node=\"670e40bd06b5a\" style=\"width: 100%;\">\n<div class=\"fl-col-content fl-node-content\">\n<div class=\"fl-module fl-module-photo fl-node-670e40bd06b9c\" data-animation-delay=\"0.0\" data-node=\"670e40bd06b9c\">\n<div class=\"fl-module-content fl-node-content\">\n<div class=\"fl-photo fl-photo-align-center\" itemscope=\"\" itemtype=\"http:\/\/schema.org\/ImageObject\">\n<div class=\"fl-photo-content fl-photo-img-jpg\"> <img decoding=\"async\" alt=\"Wafers SIC\" class=\"fl-photo-img wp-image-2174\" itemprop=\"image\" src=\"\/wp-content\/uploads\/2025\/09\/4530d9462eb0bb0b.webp\"> <\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/div>","protected":false},"excerpt":{"rendered":"<p><?xml encoding=\"utf-8\" ?><\/p>\n<p>Semicera&rsquo;s Silicon-on-Insulator wafers provide high-performance solutions for advanced semiconductor applications. Ideally suited for MEMS, sensors, and microelectronics, these wafers provide excellent electrical isolation and low parasitic capacitance. Semicera ensures precision manufacturing, delivering consistent quality for a range of innovative technologies. We look forward to being your long-term partner in China.<\/p>","protected":false},"featured_media":540,"comment_status":"closed","ping_status":"open","template":"","meta":[],"product_brand":[],"product_cat":[16,18],"product_tag":[],"class_list":{"0":"post-1334","1":"product","2":"type-product","3":"status-publish","4":"has-post-thumbnail","6":"product_cat-cvd-sic","7":"product_cat-sic-epitaxial-parts","9":"first","10":"instock","11":"product-type-simple"},"_links":{"self":[{"href":"https:\/\/www.cn-semiconductorparts.com\/fr\/wp-json\/wp\/v2\/product\/1334","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.cn-semiconductorparts.com\/fr\/wp-json\/wp\/v2\/product"}],"about":[{"href":"https:\/\/www.cn-semiconductorparts.com\/fr\/wp-json\/wp\/v2\/types\/product"}],"replies":[{"embeddable":true,"href":"https:\/\/www.cn-semiconductorparts.com\/fr\/wp-json\/wp\/v2\/comments?post=1334"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/www.cn-semiconductorparts.com\/fr\/wp-json\/wp\/v2\/media\/540"}],"wp:attachment":[{"href":"https:\/\/www.cn-semiconductorparts.com\/fr\/wp-json\/wp\/v2\/media?parent=1334"}],"wp:term":[{"taxonomy":"product_brand","embeddable":true,"href":"https:\/\/www.cn-semiconductorparts.com\/fr\/wp-json\/wp\/v2\/product_brand?post=1334"},{"taxonomy":"product_cat","embeddable":true,"href":"https:\/\/www.cn-semiconductorparts.com\/fr\/wp-json\/wp\/v2\/product_cat?post=1334"},{"taxonomy":"product_tag","embeddable":true,"href":"https:\/\/www.cn-semiconductorparts.com\/fr\/wp-json\/wp\/v2\/product_tag?post=1334"}],"curies":[{"name":"WP","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}