Semicera offers a comprehensive range of susceptors and graphite components designed for various epitaxy reactors.Through strategic partnerships with industry-leading OEMs, extensive materials expertise, and advanced manufacturing capabilities, Semicera delivers tailored designs to meet the specific requirements of your application. Our commitment to excellence ensures that you receive optimal solutions for your epitaxy reactor needs.
Our company provides SiC coating process services on the surface of graphite, ceramics and other materials by CVD method, so that special gases containing carbon and silicon can react at high temperature to obtain high-purity Sic molecules, which can be deposited on the surface of coated materials to form a SiC protective layer for epitaxy barrel type hy pnotic.
Main features:
1. Alta purezza SIC con la grafite rivestita
2. Resistenza al calore superiore e uniformità termica
3. Fine SiC crystal coated for a smooth surface
4. alta durata contro la pulizia chimica
Main Specifications of CVD-SIC Coating
Proprietà SIC-CVD |
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Struttura cristallina | Fase β FCC | |
Densità | g/cm ³ | 3.21 |
Durezza | Vickers Durezza | 2500 |
Dimensione del grano | µm | 2~10 |
Purezza chimica | % | 99.99995 |
Capacità termica | J · kg-1 · k-1 | 640 |
Temperatura di sublimazione | ℃ | 2700 |
Forza felexurale | MPA (RT 4-point) | 415 |
Modulo di Young | GPA (4pt Bend, 1300 ℃) | 430 |
Espansione termica (CTE) | 10-6K-1 | 4.5 |
Conducibilità termica | (W/MK) | 300 |