Semicera offers a comprehensive range of susceptors and graphite components designed for various epitaxy reactors.Through strategic partnerships with industry-leading OEMs, extensive materials expertise, and advanced manufacturing capabilities, Semicera delivers tailored designs to meet the specific requirements of your application. Our commitment to excellence ensures that you receive optimal solutions for your epitaxy reactor needs.
Our company provides SiC coating process services on the surface of graphite, ceramics and other materials by CVD method, so that special gases containing carbon and silicon can react at high temperature to obtain high-purity Sic molecules, which can be deposited on the surface of coated materials to form a SiC protective layer for epitaxy barrel type hy pnotic.
1. Resistenza all'ossidazione ad alta temperatura:
La resistenza all'ossidazione è ancora molto buona quando la temperatura è alta fino al 1600 C.
2. High purity : made by chemical vapor deposition under high temperature chlorination condition.
3. Resistenza all'erosione: alta durezza, superficie compatta, particelle fini.
4. Resistenza alla corrosione: acido, alcali, sale e reagenti organici.
| Proprietà SIC-CVD | ||
| Struttura cristallina | FCC β phase | |
| Densità | g/cm ³ | 3.21 |
| Durezza | Vickers Durezza | 2500 |
| Dimensione del grano | μm | 2~10 |
| Purezza chimica | % | 99.99995 |
| Capacità termica | J·kg-1 ·K-1 | 640 |
| Temperatura di sublimazione | ℃ | 2700 |
| Forza felexurale | MPa (RT 4-point) | 415 |
| Young’ s Modulus | Gpa (4pt bend, 1300℃) | 430 |
| Espansione termica (CTE) | 10-6K-1 | 4.5 |
| Conducibilità termica | (W/MK) | 300 |
