Suscettori di base di grafite con rivestimento SIC per MOCVD

The superior SiC Coated Graphite Base Susceptors for MOCVD by Semicera, designed to revolutionize your semiconductor growth processes. Semicera’s state-of-the-art susceptor, featuring a graphite base coated with high-quality SiC, offers unparalleled performance and efficiency in MOCVD applications.

Descrizione

SiC Coated Graphite Base Susceptors for MOCVD from semicera are engineered to provide exceptional performance in epitaxial growth processes. The high-quality silicon carbide coating on the graphite base ensures stability, durability, and optimal thermal conductivity during MOCVD (Metal Organic Chemical Vapor Deposition) operations. By using semicera’s innovative susceptor technology, you can achieve enhanced precision and efficiency in Si Epitaxy and SiC Epitaxy applications.

These MOCVD Susceptors are designed to support a range of essential semiconductor components, such as PSS Etching Carrier, ICP Etching Carrier, and RTP Carrier, making them versatile for various etching and epitaxial tasks. Semicera’s commitment to high standards ensures that these susceptors meet the rigorous demands of modern semiconductor production.

Ideal for use in LED Epitaxial Susceptor, Barrel Susceptor, and Monocrystalline Silicon processes, these susceptors can be customized for different wafer sizes, including Pancake Susceptor configurations. They are also highly effective in handling Photovoltaic Parts, making them a crucial component in the development of efficient solar cells.

In addition, SiC Coated Graphite Base Susceptors for MOCVD are optimized for GaN on SiC Epitaxy, offering high compatibility with advanced semiconductor materials. Whether you’re focused on improving yields or enhancing the quality of epitaxial growth, semicera’s susceptors provide the reliability and performance needed for success in high-tech industries.

 

Caratteristiche principali

1. Alta purezza SIC con la grafite rivestita

2. Resistenza al calore superiore e uniformità termica

3. cristallo SiC fine rivestito per una superficie liscia

4. alta durata contro la pulizia chimica

 

Specifiche principali dei rivestimenti CVD-SIC:

Sic-cvd
Densità (G/CC) 3.21
Forza di flessione (MPA) 470
Espansione termica (10-6/K) 4
Conducibilità termica (W/MK) 300

Imbarcazione e spedizione

Capacità di fornitura:
10000 pezzi/pezzi al mese
Imballaggio e consegna:
Imballaggio: imballaggio standard e forte
Poly Bag + Box + Carton + Pallet
Porta:
Ningbo/Shenzhen/Shanghai
Tempi di consegna:

Quantità (pezzi)

1-1000

>1000

 Est. Tempo (giorni) 30 To be negotiated

Luogo di lavoro semicera

Semicera lavoro posto 2

Macchina per attrezzature

Elaborazione della CNN, pulizia chimica, rivestimento CVD

Semicera ware house

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