SiC coated process for graphite base SiC Coated Graphite Carriers

Semicera Energy Technology Co., Ltd. is a leading supplier of advanced semiconductor ceramics. Our main products include: Silicon carbide etched discs, silicon carbide boat trailers, silicon carbide wafer ships (PV & Semiconductor), silicon carbide furnace tubes, silicon carbide cantilever paddles, silicon carbide chuck, silicon carbide beams, as well as CVD SiC coatings and TaC coatings.The products are mainly used in the semiconductor and photovoltaic industries, such as crystal growth, epitaxy, etching, packaging, coating and diffusion furnace equipment.

Descrizione

We maintain very close tolerances when applying the SiC coating, using high-precision machining to ensure a uniform susceptor profile. We also produce materials with ideal electrical resistance properties for use in inductively heated systems. All finished components come with a purity and dimensional compliance certificate.

Our company provides SiC coating process services by CVD method on the surface of graphite, ceramics and other materials, so that special gases containing carbon and silicon react at high temperature to obtain high purity SiC molecules, molecules deposited on the surface of the coated materials, forming SIC protective layer. The SIC formed is firmly bonded to the graphite base, giving the graphite base special properties, thus making the surface of the graphite compact, Porosity-free, high temperature resistance, corrosion resistance and oxidation resistance.

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CVD process delivers extremely high purity and theoretical density of SiC coating with no porosity. What’s more, as silicon carbide is very hard, it can be polished to a mirror-like surface. CVD silicon carbide (SiC) coating delivered several advantages including ultra-high purity surface and extremely wear durability. As the coated products have great performance in high vacuum and high temperature circumstance, they are ideal for applications in semiconductor industry and other ultra-clean environment. We also provide pyrolytic graphite (PG) products.

 

Caratteristiche principali

1. Resistenza all'ossidazione ad alta temperatura:
La resistenza all'ossidazione è ancora molto buona quando la temperatura è alta fino al 1600 C.
2. Purità elevata: realizzata mediante deposizione di vapore chimico in condizioni di clorazione ad alta temperatura.
3. Resistenza all'erosione: alta durezza, superficie compatta, particelle fini.
4. Resistenza alla corrosione: acido, alcali, sale e reagenti organici.

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Main Specifications of CVD-SIC Coatings

SiC-CVD
Densità (g/cc) 3.21
Flexural strength (Mpa) 470
Thermal expansion (10-6/K) 4
Conducibilità termica (W/MK) 300

Application

CVD silicon carbide coating has been applied in semiconductor industries already, such as MOCVD tray, RTP and oxide etching chamber since silicon nitride has great thermal shock resistance and can withstand high energy plasma.
-Silicon carbide is widely used in semiconductor and coating.

Application

Supply Ability:
10000 Piece/Pieces per Month
Packaging & Delivery:
Packing:Standard & Strong Packing
Poly bag + Box + Carton + Pallet
Port:
Ningbo/Shenzhen/Shanghai
Lead Time:

Quantity(Pieces) 1 – 1000 >1000
Est. Time(days) 30 To be negotiated

Luogo di lavoro semicera

Semicera lavoro posto 2

Macchina per attrezzature

Elaborazione della CNN, pulizia chimica, rivestimento CVD

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