{"id":2224,"date":"2025-09-11T05:33:27","date_gmt":"2025-09-11T05:33:27","guid":{"rendered":"https:\/\/weitai2.globaldeepsea.site\/product\/pss-processing-carrier-for-semiconductor-wafer-transmission\/"},"modified":"2026-04-29T15:28:11","modified_gmt":"2026-04-29T07:28:11","slug":"pss-processing-carrier-for-semiconductor-wafer-transmission","status":"publish","type":"product","link":"https:\/\/www.cn-semiconductorparts.com\/it\/product\/pss-processing-carrier-for-semiconductor-wafer-transmission\/","title":{"rendered":"PSS Processing Carrier for Semiconductor Wafer Transmission"},"content":{"rendered":"
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Product Description<\/p>\n

La nostra azienda fornisce servizi di processo di rivestimento SIC con metodo CVD sulla superficie di grafite, ceramica e altri materiali, in modo che gas speciali contenenti carbonio e silicio reagiscono ad alta temperatura per ottenere molecole SiC ad alta purezza, molecole depositate sulla superficie dei materiali rivestiti, formando lo strato di protezione SIC.<\/p>\n

Caratteristiche principali:<\/p>\n

1. Resistenza all'ossidazione ad alta temperatura:<\/p>\n

La resistenza all'ossidazione \u00e8 ancora molto buona quando la temperatura \u00e8 alta fino al 1600 C.<\/p>\n

2. High purity : made by chemical vapor deposition under high temperature chlorination condition.<\/p>\n

3. Resistenza all'erosione: alta durezza, superficie compatta, particelle fini.<\/p>\n

4. Resistenza alla corrosione: acido, alcali, sale e reagenti organici.<\/p>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n

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\"PSS <\/img><\/a> <\/div>\n<\/p><\/div>\n<\/p><\/div>\n
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\"PSS <\/img><\/a> <\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n
<\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n
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Specifiche principali del rivestimento CVD-SIC<\/p>\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n
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Propriet\u00e0 SIC-CVD<\/p>\n<\/td>\n<\/tr>\n

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Struttura cristallina<\/p>\n<\/td>\n

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Fase \u03b2 FCC<\/p>\n<\/td>\n<\/tr>\n

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Densit\u00e0<\/p>\n<\/td>\n

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g\/cm \u00b3<\/p>\n<\/td>\n

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3.21<\/p>\n<\/td>\n<\/tr>\n

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Durezza<\/p>\n<\/td>\n

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Vickers Durezza<\/p>\n<\/td>\n

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2500<\/p>\n<\/td>\n<\/tr>\n

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Dimensione del grano<\/p>\n<\/td>\n

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\u00b5m<\/p>\n<\/td>\n

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2~10<\/p>\n<\/td>\n<\/tr>\n

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Purezza chimica<\/p>\n<\/td>\n

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%<\/p>\n<\/td>\n

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99.99995<\/p>\n<\/td>\n<\/tr>\n

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Capacit\u00e0 termica<\/p>\n<\/td>\n

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J \u00b7 kg-1 \u00b7 k-1<\/p>\n<\/td>\n

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640<\/p>\n<\/td>\n<\/tr>\n

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Temperatura di sublimazione<\/p>\n<\/td>\n

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\u2103<\/p>\n<\/td>\n

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2700<\/p>\n<\/td>\n<\/tr>\n

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Forza felexurale<\/p>\n<\/td>\n

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MPA (RT 4-point)<\/p>\n<\/td>\n

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415<\/p>\n<\/td>\n<\/tr>\n

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Young’ s Modulus<\/p>\n<\/td>\n

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GPA (4pt Bend, 1300 \u2103)<\/p>\n<\/td>\n

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430<\/p>\n<\/td>\n<\/tr>\n

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Espansione termica (CTE)<\/p>\n<\/td>\n

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10-6K-1<\/p>\n<\/td>\n

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4.5<\/p>\n<\/td>\n<\/tr>\n

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Conducibilit\u00e0 termica<\/p>\n<\/td>\n

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(W\/MK)<\/p>\n<\/td>\n

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300<\/p>\n<\/td>\n<\/tr>\n<\/tbody>\n<\/table><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n

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\"Luogo <\/img><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n
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\"Semicera <\/img><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n
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\"Macchina <\/img><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n
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\"Elaborazione <\/img><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n
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\"Il <\/img><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/div>","protected":false},"excerpt":{"rendered":"

Semicera\u2019s PSS Processing Carrier for Semiconductor Wafer Transmission is engineered for efficient handling and transfer of semiconductor wafers during manufacturing processes. Made from high-quality materials, this carrier ensures precise alignment, minimal contamination, and smooth wafer transport. Designed for the semiconductor industry, Semicera\u2019s PSS carriers enhance process efficiency, reliability, and yield, making them an essential component in wafer processing and handling applications.<\/p>","protected":false},"featured_media":635,"comment_status":"closed","ping_status":"open","template":"","meta":[],"product_brand":[],"product_cat":[16,66],"product_tag":[],"class_list":{"0":"post-2224","1":"product","2":"type-product","3":"status-publish","4":"has-post-thumbnail","6":"product_cat-cvd-sic","7":"product_cat-etching-process-parts","9":"first","10":"instock","11":"product-type-simple"},"_links":{"self":[{"href":"https:\/\/www.cn-semiconductorparts.com\/it\/wp-json\/wp\/v2\/product\/2224","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.cn-semiconductorparts.com\/it\/wp-json\/wp\/v2\/product"}],"about":[{"href":"https:\/\/www.cn-semiconductorparts.com\/it\/wp-json\/wp\/v2\/types\/product"}],"replies":[{"embeddable":true,"href":"https:\/\/www.cn-semiconductorparts.com\/it\/wp-json\/wp\/v2\/comments?post=2224"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/www.cn-semiconductorparts.com\/it\/wp-json\/wp\/v2\/media\/635"}],"wp:attachment":[{"href":"https:\/\/www.cn-semiconductorparts.com\/it\/wp-json\/wp\/v2\/media?parent=2224"}],"wp:term":[{"taxonomy":"product_brand","embeddable":true,"href":"https:\/\/www.cn-semiconductorparts.com\/it\/wp-json\/wp\/v2\/product_brand?post=2224"},{"taxonomy":"product_cat","embeddable":true,"href":"https:\/\/www.cn-semiconductorparts.com\/it\/wp-json\/wp\/v2\/product_cat?post=2224"},{"taxonomy":"product_tag","embeddable":true,"href":"https:\/\/www.cn-semiconductorparts.com\/it\/wp-json\/wp\/v2\/product_tag?post=2224"}],"curies":[{"name":"WP","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}