Semicera Energy Technology Co., Ltd. is a leading supplier of advanced semiconductor ceramics. Our main products include: Silicon carbide etched discs, silicon carbide boat trailers, silicon carbide wafer ships (PV & Semiconductor), silicon carbide furnace tubes, silicon carbide cantilever paddles, silicon carbide chuck, silicon carbide beams, as well as CVD SiC coatings and TaC coatings.The products are mainly used in the semiconductor and photovoltaic industries, such as crystal growth, epitaxy, etching, packaging, coating and diffusion furnace equipment.
We maintain very close tolerances when applying the SiC coating, using high-precision machining to ensure a uniform susceptor profile. We also produce materials with ideal electrical resistance properties for use in inductively heated systems. All finished components come with a purity and dimensional compliance certificate.
Our company provides SiC coating process services by CVD method on the surface of graphite, ceramics and other materials, so that special gases containing carbon and silicon react at high temperature to obtain high purity SiC molecules, molecules deposited on the surface of the coated materials, forming SIC protective layer. The SIC formed is firmly bonded to the graphite base, giving the graphite base special properties, thus making the surface of the graphite compact, Porosity-free, high temperature resistance, corrosion resistance and oxidation resistance.

CVD process delivers extremely high purity and theoretical density of SiC coating with no porosity. What’s more, as silicon carbide is very hard, it can be polished to a mirror-like surface. CVD silicon carbide (SiC) coating delivered several advantages including ultra-high purity surface and extremely wear durability. As the coated products have great performance in high vacuum and high temperature circumstance, they are ideal for applications in semiconductor industry and other ultra-clean environment. We also provide pyrolytic graphite (PG) products.
1。高温酸化抵抗:
温度が1600 Cになると、酸化抵抗は非常に良好です。
2。高純度:高温塩素化条件下での化学蒸気堆積によって作られています。
3。侵食抵抗:高硬度、コンパクトな表面、微粒子。
4。耐食性:酸、アルカリ、塩、有機試薬。



| SiC-CVD | ||
| 密度 | (g/cc) | 3.21 |
| Flexural strength | (Mpa) | 470 |
| Thermal expansion | (10-6/K) | 4 |
| 熱伝導率 | (w/mk) | 300 |
CVD silicon carbide coating has been applied in semiconductor industries already, such as MOCVD tray, RTP and oxide etching chamber since silicon nitride has great thermal shock resistance and can withstand high energy plasma.
-Silicon carbide is widely used in semiconductor and coating.
Supply Ability:
10000 Piece/Pieces per Month
Packaging & Delivery:
Packing:Standard & Strong Packing
Poly bag + Box + Carton + Pallet
Port:
Ningbo/Shenzhen/Shanghai
Lead Time:
| Quantity(Pieces) | 1 – 1000 | >1000 |
| Est. Time(days) | 30 | To be negotiated |




