Silicon based GaN epitaxy

Semicera Energy Technology Co., Ltd.is a leading supplier of advanced semiconductor ceramics and the only manufacturer in China that can simultaneously provide high-purity silicon carbide ceramic(especially theRecrystallizedSiC) and CVD SiC coating. In addition, our company is also committed to ceramic fields such as alumina, aluminum nitride, zirconia, and silicon nitride, etc.

Product Description

우리 회사는 제공합니다 SIC 코팅 process services by CVD method on the surface of graphite, ceramics and other materials, so that special gases containing carbon and silicon react at high temperature to obtain high purity SiC molecules, molecules deposited on the surface of the coated materials, forming SIC protective layer.

주요 기능:

1. High temperature oxidation resistance:

the oxidation resistance is still very good when the temperature is as high as 1600 C.

2. High purity : made by chemical vapor deposition under high temperature chlorination condition.

3. Erosion resistance: high hardness, compact surface, fine particles.

4. Corrosion resistance: acid, alkali, salt and organic reagents.

 

Main Specifications of CVD-SIC Coating

SIC-CVD 특성

결정 구조

FCC β 상

밀도

g/cm ³

3.21

경도

비커스 경도

2500

곡물 크기

mm

2~10

화학적 순도

%

99.99995

열용량

J · KG-1 · K-1

640

승화 온도

2700

Felexural 강도

MPA (RT 4 점)

415

Young’ s Modulus

GPA (4pt Bend, 1300 ℃)

430

열 팽창 (CTE)

10-6K-1

4.5

열전도율

(w/mk)

300

未标题-1

17

211

세미 케라 작업 장소

Semicera Work Place 2

장비 기계

CNN 가공, 화학 세정, CVD 코팅

우리의 서비스

뉴 레터

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