항산화 고순도 SIC 코팅 MOCVD 트레이

Semicera Energy Technology Co., Ltd. is a leading supplier specializing in wafer and advanced semiconductor consumables.We are dedicated to providing high-quality, reliable, and innovative products to semiconductor manufacturing,photovoltaic industryand other related fields.Our product line includes SiC/TaC coated graphite products and ceramic products, encompassing various materials such as silicon carbide, silicon nitride, and aluminum oxide and etc.As a trusted supplier, we understand the importance of consumables in the manufacturing process, and we are committed to delivering products that meet the highest quality standards to fulfill our customers’ needs.

Description

우리 회사는 제공합니다 SIC 코팅 process services by CVD method on the surface of graphite, ceramics and other materials, so that special gases containing carbon and silicon react at high temperature to obtain high purity SiC molecules, molecules deposited on the surface of the coated materials, forming a SIC 보호 층.

 

Main Features

1. High temperature oxidation resistance:
the oxidation resistance is still very good when the temperature is as high as 1600 C.
2. High purity: made by chemical vapor deposition under high temperature chlorination condition.
3. Erosion resistance: high hardness, compact surface, fine particles.
4. Corrosion resistance: acid, alkali, salt and organic reagents.

Main Specifications of CVD-SIC Coating

SIC-CVD 특성
결정 구조 FCC β 상
밀도 g/cm ³ 3.21
경도 비커스 경도 2500
곡물 크기 mm 2~10
화학적 순도 % 99.99995
열용량 J · KG-1 · K-1 640
승화 온도 2700
Felexural 강도 MPA (RT 4 점) 415
영률 GPA (4pt Bend, 1300 ℃) 430
열 팽창 (CTE) 10-6K-1 4.5
열전도율 (w/mk) 300

MOCVD EPITAXIAL PARTS

MOCVD disk

 Equipment

about

세미 케라 작업 장소

Semicera Work Place 2

장비 기계

CNN 가공, 화학 세정, CVD 코팅

세미 케라웨어 하우스

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