Graphite Susceptor with Silicon Carbide Coating 8 inch wafer Carrier

Semicera’s Graphite Susceptor with Silicon Carbide Coating for 8-inch Wafer Carrier is designed for high-performance semiconductor processing, providing excellent thermal conductivity, chemical resistance, and durability. The silicon carbide coating ensures superior protection against oxidation and wear, enhancing the lifespan of the susceptor. Ideal for MOCVD, CVD, and other high-temperature applications, Semicera’s susceptor offers reliable performance, making it the perfect solution for efficient wafer handling and processing in semiconductor and LED manufacturing.

Description

CVD-SiC coating has the characteristics of uniform structure, compact material, high temperature resistance, oxidation resistance, high purity, acid&alkali resistance and organic reagent, with stable physical and chemical properties.
 
Compared with high-purity graphite materials, graphite begins to oxidize at 400C, which will cause a loss of powder due to oxidation, resulting in environmental pollution to peripheral devices and vacuum chambers, and increase impurities of high-purity environment.
 However, SIC 코팅 can maintain physical and chemical stability at 1600 degrees, It is widely used in modern industry, especially in semiconductor industry.

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Main Features

1. 고 순도 SIC 코팅 흑연

2. 우수한 내열 및 열 균일 성

3. 좋아 SIC 크리스탈 코팅 매끄러운 표면을 위해

4. 화학적 세정에 대한 내구성이 높다

 

Main Specifications of CVD-SIC Coatings:

SiC-CVD
밀도 (g/cc) 3.21
Flexural strength (Mpa) 470
Thermal expansion (10-6/K) 4
열전도율 (w/mk) 300

Packing and Shipping

Supply Ability:
10000 Piece/Pieces per Month
Packaging & Delivery:
Packing:Standard & Strong Packing
Poly bag + Box + Carton + Pallet
Port:
Ningbo/Shenzhen/Shanghai
Lead Time:

Quantity(Pieces) 1 – 1000 >1000
Est. Time(days) 30 To be negotiated

세미 케라 작업 장소

Semicera Work Place 2

장비 기계

CNN 가공, 화학 세정, CVD 코팅

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