Semicera offers a comprehensive range of susceptors and graphite components designed for various epitaxy reactors.Through strategic partnerships with industry-leading OEMs, extensive materials expertise, and advanced manufacturing capabilities, Semicera delivers tailored designs to meet the specific requirements of your application. Our commitment to excellence ensures that you receive optimal solutions for your epitaxy reactor needs.
Our company provides SiC coating process services on the surface of graphite, ceramics and other materials by CVD method, so that special gases containing carbon and silicon can react at high temperature to obtain high-purity Sic molecules, which can be deposited on the surface of coated materials to form a SiC protective layer for epitaxy barrel type hy pnotic.
주요 기능:
1. 고 순도 SIC 코팅 흑연
2. 우수한 내열 및 열 균일 성
3. Fine SiC crystal coated for a smooth surface
4. 화학적 세정에 대한 내구성이 높다
CVD-SIC 코팅의 주요 사양
|
SIC-CVD 특성 |
||
| 결정 구조 | FCC β phase | |
| 밀도 | g/cm ³ | 3.21 |
| 경도 | 비커스 경도 | 2500 |
| 곡물 크기 | μm | 2~10 |
| 화학적 순도 | % | 99.99995 |
| 열용량 | J·kg-1 ·K-1 | 640 |
| 승화 온도 | ℃ | 2700 |
| Felexural 강도 | MPa (RT 4-point) | 415 |
| Young’ s Modulus | Gpa (4pt bend, 1300℃) | 430 |
| 열 팽창 (CTE) | 10-6K-1 | 4.5 |
| 열전도율 | (w/mk) | 300 |
