Semicera Energy Technology Co., Ltd. is a leading supplier of advanced semiconductor ceramics. Our main products include: Silicon carbide etched discs, silicon carbide boat trailers, silicon carbide wafer ships (PV & Semiconductor), silicon carbide furnace tubes, silicon carbide cantilever paddles, silicon carbide chuck, silicon carbide beams, as well as CVD SiC coatings and TaC coatings.The products are mainly used in the semiconductor and photovoltaic industries, such as crystal growth, epitaxy, etching, packaging, coating and diffusion furnace equipment.
We maintain very close tolerances when applying the SiC coating, using high-precision machining to ensure a uniform susceptor profile. We also produce materials with ideal electrical resistance properties for use in inductively heated systems. All finished components come with a purity and dimensional compliance certificate.
Our company provides SiC coating process services by CVD method on the surface of graphite, ceramics and other materials, so that special gases containing carbon and silicon react at high temperature to obtain high purity SiC molecules, molecules deposited on the surface of the coated materials, forming SIC protective layer. The SIC formed is firmly bonded to the graphite base, giving the graphite base special properties, thus making the surface of the graphite compact, Porosity-free, high temperature resistance, corrosion resistance and oxidation resistance.

CVD process delivers extremely high purity and theoretical density of SiC coating with no porosity. What’s more, as silicon carbide is very hard, it can be polished to a mirror-like surface. CVD silicon carbide (SiC) coating delivered several advantages including ultra-high purity surface and extremely wear durability. As the coated products have great performance in high vacuum and high temperature circumstance, they are ideal for applications in semiconductor industry and other ultra-clean environment. We also provide pyrolytic graphite (PG) products.
1. 고온 산화 저항:
온도가 1600 C에 이르면 산화 저항은 여전히 매우 좋습니다.
2. 고순도 : 고온 염소화 조건 하에서 화학 증기 증착에 의해 만들어진.
3. 침식 저항 : 높은 경도, 소형 표면, 미세 입자.
4. 부식성 : 산, 알칼리, 소금 및 유기 시약.



| SIC-CVD | ||
| 밀도 | (G/CC) | 3.21 |
| 굽힘 강도 | (MPA) | 470 |
| 열 팽창 | (10-6/K) | 4 |
| 열전도율 | (w/mk) | 300 |
CVD silicon carbide coating has been applied in semiconductor industries already, such as MOCVD tray, RTP and oxide etching chamber since silicon nitride has great thermal shock resistance and can withstand high energy plasma.
-Silicon carbide is widely used in semiconductor and coating.
공급 능력:
한 달에 10000 조각/조각
포장 및 배송:
포장 : 표준 및 강력한 포장
폴리 백 + 상자 + 카톤 + 팔레트
포트:
Ningbo/Shenzhen/Shanghai
리드 타임:
| 수량 (조각) | 1 – 1000 | >1000 |
| est. 시간 (일) | 30 | To be negotiated |




