SiC Pin Trays for ICP Etching Processes in the LED Industry

Semicera’s SiC Pin Trays for ICP Etching Processes in the LED Industry are specifically designed to enhance efficiency and precision in etching applications. Made from high-quality silicon carbide, these pin trays offer excellent thermal stability, chemical resistance, and mechanical strength. Ideal for the demanding conditions of the LED manufacturing process, Semicera’s SiC pin trays ensure uniform etching, minimize contamination, and improve overall process reliability, contributing to high-quality LED production.

Product Description

Our company provides SiC coating process services by CVD method on the surface of graphite, ceramics and other materials, so that special gases containing carbon and silicon react at high temperature to obtain high purity SiC molecules, molecules deposited on the surface of the coated materials, forming SIC protective layer.

주요 기능:

1. High temperature oxidation resistance:

the oxidation resistance is still very good when the temperature is as high as 1600 C.

2. High purity : made by chemical vapor deposition under high temperature chlorination condition.

3. Erosion resistance: high hardness, compact surface, fine particles.

4. Corrosion resistance: acid, alkali, salt and organic reagents.

Silicon carbide etched disk (2)

Main Specifications of CVD-SIC Coating

SIC-CVD 특성

결정 구조

FCC β 상

밀도

g/cm ³

3.21

경도

비커스 경도

2500

곡물 크기

mm

2~10

화학적 순도

%

99.99995

열용량

J · KG-1 · K-1

640

승화 온도

2700

Felexural 강도

MPA (RT 4 점)

415

Young’ s Modulus

GPA (4pt Bend, 1300 ℃)

430

열 팽창 (CTE)

10-6K-1

4.5

열전도율

(w/mk)

300

세미 케라 작업 장소

Semicera Work Place 2

장비 기계

CNN 가공, 화학 세정, CVD 코팅

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