Silicon Carbide Coated Graphite Tool for Epitaxy

Semicera offers a comprehensive range of susceptors and graphite components designed for various epitaxy reactors.

Through strategic partnerships with industry-leading OEMs, extensive materials expertise, and advanced manufacturing capabilities, Semicera delivers tailored designs to meet the specific requirements of your application. Our commitment to excellence ensures that you receive optimal solutions for your epitaxy reactor needs.

설명

Our company provides SiC coating process services by CVD method on the surface of graphite, ceramics and other materials, so that special gases containing carbon and silicon react at high temperature to obtain high purity SiC molecules, molecules deposited on the surface of the coated materials, forming SIC protective layer.

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주요 기능

1. 고 순도 SIC 코팅 흑연

2. 우수한 내열 및 열 균일 성

3. Fine SiC crystal coated for a smooth surface

4. 화학적 세정에 대한 내구성이 높다

CVD-SIC 코팅의 주요 사양

SIC-CVD 특성
결정 구조 FCC β phase
밀도 g/cm ³ 3.21
경도 비커스 경도 2500
곡물 크기 μm 2~10
화학적 순도 % 99.99995
열용량 J·kg-1 ·K-1 640
승화 온도 2700
Felexural 강도 MPa  (RT 4-point) 415
Young’ s Modulus GPA (4pt Bend, 1300 ℃) 430
열 팽창 (CTE) 10-6K-1 4.5
열전도율 (w/mk) 300
세미 케라 작업 장소
Semicera Work Place 2
장비 기계
CNN 가공, 화학 세정, CVD 코팅
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