Semicera’s Silicon Carbide Wafer Holder is designed to support high-temperature and high-precision epitaxy processes, especially for manufacturing processes such as Si Epitaxy and SiC Epitaxy. As a key component of the epitaxy process, this product from semicera ensures excellent performance in applications such as MOCVD Susceptor and PSS Etching Carrier through innovative design. Semicera has always been committed to providing efficient and reliable solutions for the semiconductor manufacturing industry.
Silicon Carbide Wafer Holder can not only be used for RTP Carrier, LED Epitaxial Susceptor and Barrel Susceptor, but also supports stable loading in the manufacturing process of monocrystalline silicon. This product also performs well in Pancake Susceptor and Photovoltaic Parts, and is particularly suitable for use in the process of GaN on SiC Epitaxy, effectively improving production efficiency and reducing defects.
Semicera’s Silicon Carbide Wafer Holder uses high-quality silicon carbide materials, which not only has excellent high temperature resistance, but also can remain stable in corrosive environments. Whether in ICP Etching Carrier or other complex epitaxy and etching processes, this product can ensure stable wafer loading, reduce stress, and optimize manufacturing quality.
Semicera’s Silicon Carbide Wafer Holder is designed for complex epitaxy and etching processes. With its excellent performance and high durability, it has become an ideal choice in semiconductor manufacturing. Whether supporting Si Epitaxy or SiC Epitaxy, semicera is committed to providing customers with first-class products and services.
Excellent heat and corrosion resistance, Widely applicable semiconductor manufacturing equipment
