{"id":1404,"date":"2025-09-11T05:28:53","date_gmt":"2025-09-11T05:28:53","guid":{"rendered":"https:\/\/weitai2.globaldeepsea.site\/product\/10x10mm-nonpolar-m-plane-aluminum-substrate\/"},"modified":"2026-04-29T15:33:48","modified_gmt":"2026-04-29T07:33:48","slug":"10x10mm-nonpolar-m-plane-aluminum-substrate","status":"publish","type":"product","link":"https:\/\/www.cn-semiconductorparts.com\/nl\/product\/10x10mm-nonpolar-m-plane-aluminum-substrate\/","title":{"rendered":"10x10mm niet-polair m-vlak aluminium substraat"},"content":{"rendered":"
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Semicera\u2019s 10x10mm niet-polair m-vlak aluminium substraat<\/strong> is meticulously designed to meet the exacting requirements of advanced optoelectronic applications. This substrate features a nonpolar M-plane orientation, which is critical for reducing polarization effects in devices such as LEDs and laser diodes, leading to enhanced performance and efficiency.<\/span><\/p>\n

The 10x10mm niet-polair m-vlak aluminium substraat<\/strong> is crafted with exceptional crystalline quality, ensuring minimal defect densities and superior structural integrity. This makes it an ideal choice for the epitaxial growth of high-quality III-nitride films, which are essential for the development of next-generation optoelectronic devices.<\/span><\/p>\n

Semicera\u2019s precision engineering ensures that each 10x10mm niet-polair m-vlak aluminium substraat<\/strong> offers consistent thickness and surface flatness, which are crucial for uniform film deposition and device fabrication. Additionally, the substrate\u2019s compact size makes it suitable for both research and production environments, allowing for flexible use in a variety of applications. With its excellent thermal and chemical stability, this substrate provides a reliable foundation for the development of cutting-edge optoelectronic technologies.<\/span><\/p>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n

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Items<\/p>\n<\/td>\n

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Productie<\/p>\n<\/td>\n

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Onderzoek<\/p>\n<\/td>\n

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Stom<\/p>\n<\/td>\n<\/tr>\n

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Kristalparameters<\/p>\n<\/td>\n<\/tr>\n

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Polytype<\/p>\n<\/td>\n

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4H<\/p>\n<\/td>\n<\/tr>\n

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Oppervlakte -ori\u00ebntatiefout<\/p>\n<\/td>\n

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4\u00b10.15\u00b0<\/p>\n<\/td>\n<\/tr>\n

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Elektrische parameters<\/p>\n<\/td>\n<\/tr>\n

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Dopant<\/p>\n<\/td>\n

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n-type stikstof<\/p>\n<\/td>\n<\/tr>\n

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Weerstand<\/p>\n<\/td>\n

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0.015-0.025OHM \u00b7 cm<\/p>\n<\/td>\n<\/tr>\n

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Mechanische parameters<\/p>\n<\/td>\n<\/tr>\n

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Diameter<\/p>\n<\/td>\n

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150,0 \u00b1 0,2 mm<\/p>\n<\/td>\n<\/tr>\n

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Dikte<\/p>\n<\/td>\n

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350 \u00b1 25 \u00b5m<\/p>\n<\/td>\n<\/tr>\n

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Primaire platte ori\u00ebntatie<\/p>\n<\/td>\n

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[1-100]\u00b15\u00b0<\/p>\n<\/td>\n<\/tr>\n

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Primaire platte lengte<\/p>\n<\/td>\n

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47,5 \u00b1 1,5 mm<\/p>\n<\/td>\n<\/tr>\n

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Secundaire flat<\/p>\n<\/td>\n

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Geen<\/p>\n<\/td>\n<\/tr>\n

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TTV<\/p>\n<\/td>\n

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\u22645 \u00b5m<\/p>\n<\/td>\n

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\u226410 \u00b5m<\/p>\n<\/td>\n

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\u226415 \u00b5m<\/p>\n<\/td>\n<\/tr>\n

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LTV<\/p>\n<\/td>\n

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\u22643 \u03bcm (5 mm*5 mm)<\/p>\n<\/td>\n

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\u22645 \u03bcm (5 mm*5 mm)<\/p>\n<\/td>\n

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\u226410 \u03bcm (5 mm*5 mm)<\/p>\n<\/td>\n<\/tr>\n

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Boog<\/p>\n<\/td>\n

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-15 \u03bcm ~ 15 \u03bcm<\/p>\n<\/td>\n

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-35 \u03bcm ~ 35 \u03bcm<\/p>\n<\/td>\n

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-45\u03bcm ~ 45 urm<\/p>\n<\/td>\n<\/tr>\n

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Kronkelen<\/p>\n<\/td>\n

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\u226435 \u00b5m<\/p>\n<\/td>\n

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\u226445 \u00b5m<\/p>\n<\/td>\n

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\u226455 \u00b5m<\/p>\n<\/td>\n<\/tr>\n

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Voorste (si-face) ruwheid (AFM)<\/p>\n<\/td>\n

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Ra\u22640,2 nm (5\u03bcm*5\u03bcm)<\/p>\n<\/td>\n<\/tr>\n

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Structuur<\/p>\n<\/td>\n<\/tr>\n

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Micropipe dichtheid<\/p>\n<\/td>\n

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<1 EA\/CM2<\/p>\n<\/td>\n

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<10 EA\/CM2<\/p>\n<\/td>\n

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<15 EA\/CM2<\/p>\n<\/td>\n<\/tr>\n

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Metaalonzuiverheden<\/p>\n<\/td>\n

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\u22645E10atoms\/cm2<\/p>\n<\/td>\n

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NA<\/p>\n<\/td>\n<\/tr>\n

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BPD<\/p>\n<\/td>\n

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\u22641500 EA\/CM2<\/p>\n<\/td>\n

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\u22643000 EA\/CM2<\/p>\n<\/td>\n

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NA<\/p>\n<\/td>\n<\/tr>\n

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TSD<\/p>\n<\/td>\n

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\u2264500 EA\/CM2<\/p>\n<\/td>\n

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\u22641000 EA\/CM2<\/p>\n<\/td>\n

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NA<\/p>\n<\/td>\n<\/tr>\n

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Voorste kwaliteit<\/p>\n<\/td>\n<\/tr>\n

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Voorkant<\/p>\n<\/td>\n

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Si<\/p>\n<\/td>\n<\/tr>\n

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Oppervlakte -afwerking<\/p>\n<\/td>\n

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Si-face CMP<\/p>\n<\/td>\n<\/tr>\n

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Deeltjes<\/p>\n<\/td>\n

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\u226460EA\/wafer (grootte \u2265 0,3 \u03bcm)<\/p>\n<\/td>\n

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NA<\/p>\n<\/td>\n<\/tr>\n

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Krassen<\/p>\n<\/td>\n

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\u22645EA\/mm. Cumulatieve lengte \u2264diameter<\/p>\n<\/td>\n

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Cumulatieve lengte \u22642*diameter<\/p>\n<\/td>\n

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NA<\/p>\n<\/td>\n<\/tr>\n

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Sinaasappelschil\/putten\/vlekken\/strepen\/scheuren\/besmetting<\/p>\n<\/td>\n

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Geen<\/p>\n<\/td>\n

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NA<\/p>\n<\/td>\n<\/tr>\n

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Edge -chips\/inspringen\/breuk\/hexplaten<\/p>\n<\/td>\n

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Geen<\/p>\n<\/td>\n<\/tr>\n

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Polytype -gebieden<\/p>\n<\/td>\n

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Geen<\/p>\n<\/td>\n

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Cumulatief gebied \u226420%<\/p>\n<\/td>\n

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Cumulatief gebied \u226430%<\/p>\n<\/td>\n<\/tr>\n

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Laser markering vooraan<\/p>\n<\/td>\n

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Geen<\/p>\n<\/td>\n<\/tr>\n

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Rugkwaliteit<\/p>\n<\/td>\n<\/tr>\n

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Back Finish<\/p>\n<\/td>\n

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C-gezicht CMP<\/p>\n<\/td>\n<\/tr>\n

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Krassen<\/p>\n<\/td>\n

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\u22645ea\/mm, cumulatieve lengte \u22642*diameter<\/p>\n<\/td>\n

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NA<\/p>\n<\/td>\n<\/tr>\n

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Achterafwijkingen (randchips\/inspringen)<\/p>\n<\/td>\n

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Geen<\/p>\n<\/td>\n<\/tr>\n

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Terug ruwheid<\/p>\n<\/td>\n

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Ra\u22640,2 nm (5\u03bcm*5\u03bcm)<\/p>\n<\/td>\n<\/tr>\n

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Lasergrondbekleding<\/p>\n<\/td>\n

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1 mm (van bovenrand)<\/p>\n<\/td>\n<\/tr>\n

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Rand<\/p>\n<\/td>\n<\/tr>\n

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Rand<\/p>\n<\/td>\n

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Schuif<\/p>\n<\/td>\n<\/tr>\n

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Verpakking<\/p>\n<\/td>\n<\/tr>\n

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Verpakking<\/p>\n<\/td>\n

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Epi-ready met vacu\u00fcmverpakkingen<\/p>\n

Multi-wafer cassette verpakking<\/p>\n<\/td>\n<\/tr>\n

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*OPMERKINGEN: \"NA\" betekent dat er geen aanvraagitems die niet worden genoemd, verwijzen naar semi-STD.<\/p>\n<\/td>\n<\/tr>\n<\/tbody>\n<\/table><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n

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\"tech_1_2_size\" <\/img><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n
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\"Sic <\/img><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/div>","protected":false},"excerpt":{"rendered":"

10x10mm Nonpolar M-plane Aluminum Substrate\u2013 Ideal for advanced optoelectronic applications, offering superior crystalline quality and stability in a compact, high-precision format.<\/p>","protected":false},"featured_media":795,"comment_status":"closed","ping_status":"open","template":"","meta":[],"product_brand":[],"product_cat":[55,26],"product_tag":[],"class_list":{"0":"post-1404","1":"product","2":"type-product","3":"status-publish","4":"has-post-thumbnail","6":"product_cat-ain-wafer","7":"product_cat-wafer","9":"first","10":"instock","11":"product-type-simple"},"_links":{"self":[{"href":"https:\/\/www.cn-semiconductorparts.com\/nl\/wp-json\/wp\/v2\/product\/1404","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.cn-semiconductorparts.com\/nl\/wp-json\/wp\/v2\/product"}],"about":[{"href":"https:\/\/www.cn-semiconductorparts.com\/nl\/wp-json\/wp\/v2\/types\/product"}],"replies":[{"embeddable":true,"href":"https:\/\/www.cn-semiconductorparts.com\/nl\/wp-json\/wp\/v2\/comments?post=1404"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/www.cn-semiconductorparts.com\/nl\/wp-json\/wp\/v2\/media\/795"}],"wp:attachment":[{"href":"https:\/\/www.cn-semiconductorparts.com\/nl\/wp-json\/wp\/v2\/media?parent=1404"}],"wp:term":[{"taxonomy":"product_brand","embeddable":true,"href":"https:\/\/www.cn-semiconductorparts.com\/nl\/wp-json\/wp\/v2\/product_brand?post=1404"},{"taxonomy":"product_cat","embeddable":true,"href":"https:\/\/www.cn-semiconductorparts.com\/nl\/wp-json\/wp\/v2\/product_cat?post=1404"},{"taxonomy":"product_tag","embeddable":true,"href":"https:\/\/www.cn-semiconductorparts.com\/nl\/wp-json\/wp\/v2\/product_tag?post=1404"}],"curies":[{"name":"WP","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}