Zakładka TAC Wafel

Semicera’s TaC Coated Wafer Susceptor is a premium product designed for high temperature and corrosive environments. It uses advanced TaC coating technology to ensure excellent chemical inertness and thermal stability under harsh conditions, making it an ideal choice for semiconductor manufacturing.

Semicera is proud to introduce TaC Coated Wafer Susceptor, which is specially developed to meet the needs of high temperature processes, using an innovative CVD coating process to provide excellent Tantalum Carbide properties. Our Wafer Susceptor performs well in high temperature and corrosive atmospheres, showing excellent chemical inertness and thermal stability, ensuring reliable operation in extreme environments.

This Wafer Susceptor utilizes high-quality TaC coating, which not only significantly improves wear resistance, but also effectively resists chemical corrosion, ensuring a long service life. Whether in silicon epitaxy, growth or other semiconductor applications, Semicera’s TaC Coated Wafer Susceptor can provide users with stable and efficient processing performance.

Semicera has always been committed to providing customers with advanced materials and technologies. Our TaC Coated Wafer Susceptor undergoes strict quality control during the design and manufacturing process to ensure that each product meets the highest standards. We continue to improve material formulations and processes to help customers achieve higher production efficiency and product quality in complex semiconductor manufacturing.

When you choose Semicera’s TaC Coating Wafer Susceptor, you get a superior product that ensures outstanding performance in high temperature and corrosive environments, helping your industrial applications reach new heights.

 

Wysoka wydajność Tantalum Carbide Coating_ Popraw wydajność produkcji przemysłowej i zmniejsz koszty utrzymania.

Część TAC dla wzrostu pojedynczego kryształu

Przeciwko ciśnieniowej powłoka z węglikiem tantalu_ chroni sprzęt przed zużyciem i korozją.

Grafit z pierścieniem pokrytym TAC

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z TAC i bez

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Po użyciu TAC (po prawej)

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Maszyna sprzętu

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Przetwarzanie CNN, czyszczenie chemiczne, powłoka CVD

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