SiC-Coated Graphite Components for Epitaxy Applications

Semicera provides a full portfolio of high-performance susceptors and graphite components for a wide range of epitaxy reactor platforms.

Leveraging strong collaboration with leading equipment manufacturers, deep expertise in advanced materials, and state-of-the-art manufacturing technologies, we develop customized solutions tailored to the unique demands of each application. Our focus on quality, precision, and reliability enables us to support customers with optimized components that enhance epitaxial process performance and operational efficiency.

Description

Our company specializes in providing CVD SiC coating services for graphite, ceramics, and other substrate materials. Through the Chemical Vapor Deposition (CVD) process, silicon- and carbon-containing precursor gases react at elevated temperatures to generate high-purity silicon carbide (SiC). The resulting SiC is uniformly deposited onto the substrate surface, forming a dense and highly protective SiC coating that enhances corrosion resistance, wear resistance, and high-temperature performance.

         

Main Features

1. High purity SiC coated graphite, the purity can reach the 99.99995%

2. Superior heat resistance & thermal uniformity

3. Fine SiC crystal coated for a smooth surface

4. High durability against chemical cleaning

Main Specifications of CVD-SIC Coating

SiC-CVD Properties
Crystal Structure FCC β phase
Density g/cm ³ 3.21
Hardness Vickers hardness 2500
Grain Size μm 2~10
Chemical Purity % 99.99995
Heat Capacity J·kg-1 ·K-1 640
Sublimation Temperature 2700
Felexural Strength MPa  (RT 4-point) 415
Young’ s Modulus Gpa (4pt bend, 1300℃) 430
Thermal Expansion (C.T.E) 10-6K-1 4.5
Thermal conductivity (W/mK) 300

Semicera Work place

Semicera work place 2
Equipment machine
CNN processing, chemical cleaning, CVD coating
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