{"id":2224,"date":"2025-09-11T05:33:27","date_gmt":"2025-09-11T05:33:27","guid":{"rendered":"https:\/\/weitai2.globaldeepsea.site\/product\/pss-processing-carrier-for-semiconductor-wafer-transmission\/"},"modified":"2026-04-29T15:28:11","modified_gmt":"2026-04-29T07:28:11","slug":"pss-processing-carrier-for-semiconductor-wafer-transmission","status":"publish","type":"product","link":"https:\/\/www.cn-semiconductorparts.com\/pt\/product\/pss-processing-carrier-for-semiconductor-wafer-transmission\/","title":{"rendered":"PSS Processing Carrier for Semiconductor Wafer Transmission"},"content":{"rendered":"
\n
\n
\n
\n
\n
\n
\n
\n
\n
\n

Descri\u00e7\u00e3o do produto<\/p>\n

Our company provides SiC coating process services by CVD method on the surface of graphite, ceramics and other materials, so that special gases containing carbon and silicon react at high temperature to obtain high purity SiC molecules, molecules deposited on the surface of the coated materials, forming SIC protective layer.<\/p>\n

Principais caracter\u00edsticas:<\/p>\n

1. Resist\u00eancia a oxida\u00e7\u00e3o de alta temperatura:<\/p>\n

A resist\u00eancia da oxida\u00e7\u00e3o ainda \u00e9 muito boa quando a temperatura \u00e9 t\u00e3o alta quanto 1600 C.<\/p>\n

2. High purity : made by chemical vapor deposition under high temperature chlorination condition.<\/p>\n

3. Resist\u00eancia \u00e0 eros\u00e3o: alta dureza, superf\u00edcie compacta, part\u00edculas finas.<\/p>\n

4. Resist\u00eancia \u00e0 corros\u00e3o: \u00e1cido, \u00e1lcalis, sal e reagentes org\u00e2nicos.<\/p>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n

\n
\n
\n
\n
\n
\n
\n
\n
\n
\"PSS <\/img><\/a> <\/div>\n<\/p><\/div>\n<\/p><\/div>\n
\n
\n
\"PSS <\/img><\/a> <\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n
<\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n
\n
\n
\n
\n
\n
\n

Principais especifica\u00e7\u00f5es do revestimento CVD-SIC<\/p>\n\n\n\n\n\n\n\n\n\n\n\n\n\n\n
\n

Propriedades SIC-CVD<\/p>\n<\/td>\n<\/tr>\n

\n

Estrutura cristalina<\/p>\n<\/td>\n

\n

Fase \u03b2 da FCC<\/p>\n<\/td>\n<\/tr>\n

\n

Densidade<\/p>\n<\/td>\n

\n

g\/cm \u00b3<\/p>\n<\/td>\n

\n

3.21<\/p>\n<\/td>\n<\/tr>\n

\n

Dureza<\/p>\n<\/td>\n

\n

Vickers dureza<\/p>\n<\/td>\n

\n

2500<\/p>\n<\/td>\n<\/tr>\n

\n

Tamanho de gr\u00e3o<\/p>\n<\/td>\n

\n

mm<\/p>\n<\/td>\n

\n

2~10<\/p>\n<\/td>\n<\/tr>\n

\n

Pureza qu\u00edmica<\/p>\n<\/td>\n

\n

%<\/p>\n<\/td>\n

\n

99.99995<\/p>\n<\/td>\n<\/tr>\n

\n

Capacidade de calor<\/p>\n<\/td>\n

\n

J \u00b7 kg-1 \u00b7 k-1<\/p>\n<\/td>\n

\n

640<\/p>\n<\/td>\n<\/tr>\n

\n

Temperatura da sublima\u00e7\u00e3o<\/p>\n<\/td>\n

\n

\u2103<\/p>\n<\/td>\n

\n

2700<\/p>\n<\/td>\n<\/tr>\n

\n

For\u00e7a felexural<\/p>\n<\/td>\n

\n

MPA (RT 4 pontos)<\/p>\n<\/td>\n

\n

415<\/p>\n<\/td>\n<\/tr>\n

\n

Young’ s Modulus<\/p>\n<\/td>\n

\n

GPA (4pt Bend, 1300 \u2103)<\/p>\n<\/td>\n

\n

430<\/p>\n<\/td>\n<\/tr>\n

\n

Expans\u00e3o t\u00e9rmica (CTE)<\/p>\n<\/td>\n

\n

10-6K-1<\/p>\n<\/td>\n

\n

4.5<\/p>\n<\/td>\n<\/tr>\n

\n

Condutividade t\u00e9rmica<\/p>\n<\/td>\n

\n

(W\/mk)<\/p>\n<\/td>\n

\n

300<\/p>\n<\/td>\n<\/tr>\n<\/tbody>\n<\/table><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n

\n
\n
\n
\n
\n
\n
\"Local <\/img><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n
\n
\n
\n
\"Local <\/img><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n
\n
\n
\n
\"M\u00e1quina <\/img><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n
\n
\n
\n
\"Processamento <\/img><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n
\n
\n
\n
\"Nosso <\/img><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/p><\/div>\n<\/div>","protected":false},"excerpt":{"rendered":"

Semicera\u2019s PSS Processing Carrier for Semiconductor Wafer Transmission is engineered for efficient handling and transfer of semiconductor wafers during manufacturing processes. Made from high-quality materials, this carrier ensures precise alignment, minimal contamination, and smooth wafer transport. Designed for the semiconductor industry, Semicera\u2019s PSS carriers enhance process efficiency, reliability, and yield, making them an essential component in wafer processing and handling applications.<\/p>","protected":false},"featured_media":635,"comment_status":"closed","ping_status":"open","template":"","meta":[],"product_brand":[],"product_cat":[16,66],"product_tag":[],"class_list":{"0":"post-2224","1":"product","2":"type-product","3":"status-publish","4":"has-post-thumbnail","6":"product_cat-cvd-sic","7":"product_cat-etching-process-parts","9":"first","10":"instock","11":"product-type-simple"},"_links":{"self":[{"href":"https:\/\/www.cn-semiconductorparts.com\/pt\/wp-json\/wp\/v2\/product\/2224","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/www.cn-semiconductorparts.com\/pt\/wp-json\/wp\/v2\/product"}],"about":[{"href":"https:\/\/www.cn-semiconductorparts.com\/pt\/wp-json\/wp\/v2\/types\/product"}],"replies":[{"embeddable":true,"href":"https:\/\/www.cn-semiconductorparts.com\/pt\/wp-json\/wp\/v2\/comments?post=2224"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/www.cn-semiconductorparts.com\/pt\/wp-json\/wp\/v2\/media\/635"}],"wp:attachment":[{"href":"https:\/\/www.cn-semiconductorparts.com\/pt\/wp-json\/wp\/v2\/media?parent=2224"}],"wp:term":[{"taxonomy":"product_brand","embeddable":true,"href":"https:\/\/www.cn-semiconductorparts.com\/pt\/wp-json\/wp\/v2\/product_brand?post=2224"},{"taxonomy":"product_cat","embeddable":true,"href":"https:\/\/www.cn-semiconductorparts.com\/pt\/wp-json\/wp\/v2\/product_cat?post=2224"},{"taxonomy":"product_tag","embeddable":true,"href":"https:\/\/www.cn-semiconductorparts.com\/pt\/wp-json\/wp\/v2\/product_tag?post=2224"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}