Semicera offers a comprehensive range of susceptors and graphite components designed for various epitaxy reactors.Through strategic partnerships with industry-leading OEMs, extensive materials expertise, and advanced manufacturing capabilities, Semicera delivers tailored designs to meet the specific requirements of your application. Our commitment to excellence ensures that you receive optimal solutions for your epitaxy reactor needs.
Our company provides SiC coating process services on the surface of graphite, ceramics and other materials by CVD method, so that special gases containing carbon and silicon can react at high temperature to obtain high-purity Sic molecules, which can be deposited on the surface of coated materials to form a SiC protective layer for epitaxy barrel type hy pnotic.
الميزات الرئيسية:
1. نقاء عالية الكيس المغلفة
2. مقاومة الحرارة المتفوقة والتوحيد الحراري
3. Fine SiC crystal coated for a smooth surface
4. المتانة العالية ضد التنظيف الكيميائي
Main Specifications of CVD-SIC Coating
|
خصائص SIC-CVD |
||
| بنية البلورة | FCC β phase | |
| كثافة | g/cm ³ | 3.21 |
| صلابة | فيكرز صلابة | 2500 |
| حجم الحبوب | μm | 2~10 |
| نقاء كيميائي | % | 99.99995 |
| سعة الحرارة | J·kg-1 ·K-1 | 640 |
| درجة حرارة التسامي | ℃ | 2700 |
| قوة فردية | MPa (RT 4-point) | 415 |
| Young’ s Modulus | Gpa (4pt bend, 1300℃) | 430 |
| التمدد الحراري (CTE) | 10-6K-1 | 4.5 |
| الموصلية الحرارية | (W/MK) | 300 |
