MOCVD 3×2”Susceptor

Semicera’s MOCVD 3×2” Susceptor is a key component specially designed for epitaxy processes in the semiconductor industry, especially for سي epitaxy  و كذا epitaxy  processes. The MOCVD Susceptor ensures uniform temperature distribution during the epitaxy process through optimized thermal conductivity, thereby improving the accuracy and quality of monocrystalline silicon (Monocrystalline Silicon) deposition.

Semicera has always focused on providing customers with high-quality MOCVD 3×2” Susceptors. Made of advanced materials, this product not only has excellent high temperature resistance, but also remains stable in complex chemical environments. It performs well in various epitaxy equipment, especially in Barrel Susceptor applications, and its reliability and performance are widely recognized.

We provide customized MOCVD Susceptors for different process requirements to maximize production efficiency and reduce material loss. Semicera’s MOCVD 3×2” Susceptor not only extends the life of the equipment, but also provides more stable support for سي epitaxy  و كذا epitaxy  processes through precision design, ensuring the consistency of epitaxial layer quality and high purity of the product.

Semicera is always committed to providing customers with reliable, durable and efficient epitaxial equipment components. Whether in laboratory environments or large-scale industrial production, the MOCVD 3×2” Susceptor can meet the most stringent technical requirements, helping customers achieve higher process control and better product output.