Semicera’s Semiconductor MOCVD Substrate Heater and MOCVD Heating Element are designed for high-performance applications in Metal-Organic Chemical Vapor Deposition (MOCVD) processes. These advanced heating solutions provide precise temperature control, excellent thermal stability, and uniform heat distribution, ensuring optimal conditions for semiconductor and LED production. With Semicera’s high-quality materials, you can rely on consistent performance, durability, and efficiency in your MOCVD substrate heating process, enhancing overall production quality.
MOCVD Substrate Heater, Heating Elements For MOCVD
Graphite heater:
The graphite heater components are used in the high temperature furnace with temperature reached 2200 degree at vacuum environment and 3000 degree in the deoxidized and inserted gas environment.
1. توحيد هيكل التدفئة.
2. الموصلية الكهربائية الجيدة والحمل الكهربائي العالي.
3. مقاومة التآكل.
4. inoxidizability.
5. نقاء كيميائي مرتفع.
6. قوة ميكانيكية عالية.
The advantage is energy efficient, high value and low maintenance.
We can produce anti-oxidation and long life span graphite crucible, graphite mold and all parts of graphite heater.
Advantage:High temperature resistance
Application:MOCVD/Vacuum furnace/Hot Zone
Bulk Density:1.68-1.91g/cm3
Flexural strength: 30-46Mpa
Resistivity:7-12μΩm
| المواصفات الفنية | VET-M3 |
| كثافة كبيرة (ز/سم 3) | ≥1.85 |
| محتوى الرماد (جزء في المليون) | ≤500 |
| صلابة الشاطئ | ≥45 |
| مقاومة محددة (μ.Ω.M) | ≤12 |
| قوة الانثناء (MPA) | ≥40 |
| قوة الضغط (MPA) | ≥70 |
| الأعلى. حجم الحبوب (ميكرون) | ≤43 |
| معامل التمدد الحراري مم/درجة مئوية | ≤4.4*10-6 |
Graphite heater for electric furnace has properties of heat resistance, oxidation resistance, good electrical conductivity and better mechanical intensity. We can machine various types of graphite heater according to customers’ designs.
WeiTai Energy Technology Co., Ltd. is a leading supplier of advanced semiconductor ceramics and the only manufacturer in China that can simultaneously provide high-purity silicon carbide ceramic(especially the Recrystallized SiC) and CVD SiC coating. In addition, our company is also committed to ceramic fields such as alumina, aluminum nitride, zirconia, and silicon nitride, etc.
منتجاتنا الرئيسية بما في ذلك: قرص الحفر كربيد السيليكون ، قارب كربيد السيليكون ، قارب رقائق كربيد السيليكون (الكهروضوئية وشبكيات الموصلات) ، أنبوب فرن كربيد السيليكون ، ومجدان الكابينة من السيليكون ، وتجديف الكآبة السيليكون ، ومكافحة السيليكون. تستخدم المنتجات بشكل أساسي في صناعات أشباه الموصلات والصناعة الكهروضوئية ، مثل معدات النمو الكريستالي ، و Epitaxy ، والحفر ، والتعبئة ، والطلاء والانتشار ، وما إلى ذلك.
Our company has the complete production equipment such as molding, sintering, processing , coating equipment, etc., which can complete all the necessary links of product production and have higher controllability of product quality; The optimal production plan can be selected according to the needs of the product, resulting in lower cost and providing customers with more competitive products; We can flexibly and efficiently schedule production based on order delivery requirements and in conjunction with online order management systems, providing customers with faster and more guaranteed delivery time.
