The Tantalum Carbide Coated Wafer Carrier by Semicera Semiconductor is engineered for high performance in semiconductor manufacturing. Featuring a robust tantalum carbide coating, it ensures exceptional wear resistance, high thermal stability, and superior protection in harsh environments. Ideal for MOCVD processes, this carrier enhances wafer processing efficiency, extends equipment lifespan, and delivers consistent results in critical applications.
Semicera bietet spezielle Tantal -Carbid -Beschichtungen (TAC) für verschiedene Komponenten und Träger. Das führende Beschichtungsprozess von Semizera ermöglicht Tantal -Carbid (TAC) -Hellbeschichtungen, um eine hohe Reinheit, hohe Temperaturstabilität und hohe chemische Toleranz zu erzielen, die Produktqualität von SIC/GaN -Kristallen und EPI -Schichten zu verbessern (SchichtenGraphitbeschichtete TAC -Suszeptor) und die Lebensdauer von Schlüsselreaktorkomponenten verlängern. Die Verwendung von Tantal -Carbid -TAC -Beschichtung besteht darin, das Edgeproblem zu lösen und die Qualität des Kristallwachstums zu verbessern. Semizera hat den Durchbruch die Tantal -Carbidbeschichtungstechnologie (CVD) durch einen Durchbruch und erreicht das internationale Fortgeschrittenen.
Tantalum carbide coated wafer carriers are widely used in wafer processing and handling processes in semiconductor manufacturing processes. They provide stable support and protection to ensure the safety, accuracy and consistency of wafers during the manufacturing process. Tantalum carbide coatings can extend the service life of the carrier, reduce costs, and improve the quality and reliability of semiconductor products.
Description of tantalum carbide coated wafer carrier is as follows:
1. Material selection: Tantalum carbide is a material with excellent performance, high hardness, high melting point, corrosion resistance and excellent mechanical properties, so it is widely used in semiconductor manufacturing process.
2. Surface coating: Tantalum carbide coating is applied to the surface of wafer carrier through a special coating process to form a uniform and dense tantalum carbide coating. This coating can provide additional protection and wear resistance, while having good thermal conductivity.
3. Flatness and precision: Tantalum carbide coated wafer carrier has a high degree of flatness and precision, ensuring the stability and accuracy of wafers during the manufacturing process. The flatness and finish of the carrier surface are critical to ensure the quality and performance of the wafer.
4. Temperature stability: Tantalum carbide coated wafer carriers can maintain stability in high temperature environments without deformation or loosening, ensuring the stability and consistency of wafers in high temperature processes.
5. Corrosion resistance: Tantalum carbide coatings have excellent corrosion resistance, can resist the erosion of chemicals and solvents, and protect the carrier from liquid and gas corrosion.
Außerdem, Semicera TAC-beschichtete Produkte zeigen eine längere Lebensdauer und einen größeren Widerstand mit hohem Temperatur im Vergleich zu SiC -Beschichtungen. Labormessungen haben gezeigt, dass unsere TAC -Beschichtungen kann bei Temperaturen von bis zu 2300 Grad Celsius für längere Perioden konsequent funktionieren. Im Folgenden finden Sie einige Beispiele für unsere Proben:
