19 pieces of 2 inch graphite base MOCVD equipment parts

● Product introduction and use: Place 19 pieces of 2 inch substrate for the growth of blue-green epitaxial films in LED production
● Device location of the product: in the reaction chamber, in direct contact with the wafer
● Main downstream products : LED chips
● Main end market: LED

Beschreibung

 

 

 

 

 

Our company provides SiC coating process services by CVD method on the surface of graphite, ceramics and other materials, so that special gases containing carbon and silicon react at high temperature to obtain high purity SiC molecules, molecules deposited on the surface of the coated materials, forming SiC protective layer.

 

 

 

 

 

 

 

 

 

Hauptmerkmale

 

 

 

 

 

1. High temperature oxidation resistance:
the oxidation resistance is still very good when the temperature is as high as 1600 C.
2. High purity: made by chemical vapor deposition under high temperature chlorination condition.
3. Erosion resistance: high hardness, compact surface, fine particles.
4. Corrosion resistance: acid, alkali, salt and organic reagents.

 

 

 

 

 

 

 

 

 

Main Specifications of CVD-SIC Coating

 

 

 

 

 

SIC-CVD-Eigenschaften
Kristallstruktur FCC β phase
Dichte g/cm ³ 3.21
Härte Vickers Härte 2500
Körnung μm 2~10
Chemische Reinheit % 99.99995
Wärmekapazität J·kg-1 ·K-1 640
Sublimationstemperatur 2700
Felexurale Stärke MPa  (RT 4-point) 415
Young’ s Modulus GPA (4PT Bend, 1300 ℃) 430
Wärmeausdehnung (CTE) 10-6K-1 4.5
Wärmeleitfähigkeit (W/mk) 300

 

 

 

 

 

19 pieces of 2 inch graphite base MOCVD equipment parts

 

 

 

 

 

 

 

 

 

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