Semicera’s Semiconductor MOCVD Substrate Heater and MOCVD Heating Element are designed for high-performance applications in Metal-Organic Chemical Vapor Deposition (MOCVD) processes. These advanced heating solutions provide precise temperature control, excellent thermal stability, and uniform heat distribution, ensuring optimal conditions for semiconductor and LED production. With Semicera’s high-quality materials, you can rely on consistent performance, durability, and efficiency in your MOCVD substrate heating process, enhancing overall production quality.
MOCVD Substrate Heater, Heating Elements For MOCVD
Graphite heater:
The graphite heater components are used in the high temperature furnace with temperature reached 2200 degree at vacuum environment and 3000 degree in the deoxidized and inserted gas environment.
1. Gleichmäßigkeit der Heizstruktur.
2. gute elektrische Leitfähigkeit und hohe elektrische Belastung.
3. Korrosionsbeständigkeit.
4. Inoxidizierbarkeit.
5. Hohe chemische Reinheit.
6. Hohe mechanische Festigkeit.
Der Vorteil ist energieeffizient, hoher Wert und geringer Wartung.
Wir können Antioxidation und lange Lebensspanne Graphit, Graphitform und alle Teile der Graphitheizung erzeugen.
Advantage:High temperature resistance
Application:MOCVD/Vacuum furnace/Hot Zone
Bulk Density:1.68-1.91g/cm3
Flexural strength: 30-46Mpa
Resistivity:7-12μΩm
| Technische Spezifikation | VET-M3 |
| Schüttdichte (g/cm3) | ≥1.85 |
| Aschegehalt (PPM) | ≤500 |
| Küstenhärte | ≥45 |
| Spezifischer Widerstand (μ.ω.M) | ≤12 |
| Biegerstärke (MPA) | ≥40 |
| Druckfestigkeit (MPA) | ≥70 |
| Max. Korngröße (μm) | ≤43 |
| Wärmeausdehnungskoeffizient mm/° C | ≤4.4*10-6 |
Graphitheizung für elektrische Ofen weist Eigenschaften von Wärmefestigkeit, Oxidationsbeständigkeit, guter elektrischer Leitfähigkeit und besserer mechanischer Intensität auf. Wir können verschiedene Arten von Graphitheizungen gemäß den Designs der Kunden maschben.
WeiTai Energy Technology Co., Ltd. is a leading supplier of advanced semiconductor ceramics and the only manufacturer in China that can simultaneously provide high-purity silicon carbide ceramic(especially the Recrystallized SiC) and CVD SiC coating. In addition, our company is also committed to ceramic fields such as alumina, aluminum nitride, zirconia, and silicon nitride, etc.
Our main products including: silicon carbide etching disc, silicon carbide boat tow, silicon carbide wafer boat(Photovoltaic&Semiconductor), silicon carbide furnace tube, silicon carbide cantilever paddle, silicon carbide chucks, silicon carbide beam, as well as the CVD SiC coating and TaC coating. The products mainly used in the semiconductor and photovoltaic industries, such as equipment for crystal growth, epitaxy, etching, packaging, coating and diffusion furnaces,etc.
Our company has the complete production equipment such as molding, sintering, processing , coating equipment, etc., which can complete all the necessary links of product production and have higher controllability of product quality; The optimal production plan can be selected according to the needs of the product, resulting in lower cost and providing customers with more competitive products; We can flexibly and efficiently schedule production based on order delivery requirements and in conjunction with online order management systems, providing customers with faster and more guaranteed delivery time.
