Semicera’s SiC Pin Trays for ICP Etching Processes in the LED Industry are specifically designed to enhance efficiency and precision in etching applications. Made from high-quality silicon carbide, these pin trays offer excellent thermal stability, chemical resistance, and mechanical strength. Ideal for the demanding conditions of the LED manufacturing process, Semicera’s SiC pin trays ensure uniform etching, minimize contamination, and improve overall process reliability, contributing to high-quality LED production.
Product Description
Our company provides SiC coating process services by CVD method on the surface of graphite, ceramics and other materials, so that special gases containing carbon and silicon react at high temperature to obtain high purity SiC molecules, molecules deposited on the surface of the coated materials, forming SIC protective layer.
Hauptmerkmale:
1. High temperature oxidation resistance:
the oxidation resistance is still very good when the temperature is as high as 1600 C.
2. High purity : made by chemical vapor deposition under high temperature chlorination condition.
3. Erosion resistance: high hardness, compact surface, fine particles.
4. Corrosion resistance: acid, alkali, salt and organic reagents.
Main Specifications of CVD-SIC Coating
|
SIC-CVD-Eigenschaften |
||
|
Kristallstruktur |
FCC -β -Phase |
|
|
Dichte |
g/cm ³ |
3.21 |
|
Härte |
Vickers Härte |
2500 |
|
Körnung |
mm |
2~10 |
|
Chemische Reinheit |
% |
99.99995 |
|
Wärmekapazität |
J · kg-1 · k-1 |
640 |
|
Sublimationstemperatur |
℃ |
2700 |
|
Felexurale Stärke |
MPA (RT 4-Punkt) |
415 |
|
Young’ s Modulus |
GPA (4PT Bend, 1300 ℃) |
430 |
|
Wärmeausdehnung (CTE) |
10-6K-1 |
4.5 |
|
Wärmeleitfähigkeit |
(W/mk) |
300 |
