Silicon Carbide Coated Graphite Tool for Epitaxy

Semicera offers a comprehensive range of susceptors and graphite components designed for various epitaxy reactors.Through strategic partnerships with industry-leading OEMs, extensive materials expertise, and advanced manufacturing capabilities, Semicera delivers tailored designs to meet the specific requirements of your application. Our commitment to excellence ensures that you receive optimal solutions for your epitaxy reactor needs.

Beschreibung

Our company provides SiC coating process services by CVD method on the surface of graphite, ceramics and other materials, so that special gases containing carbon and silicon react at high temperature to obtain high purity SiC molecules, molecules deposited on the surface of the coated materials, forming SIC protective layer.

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Hauptmerkmale

1. Hochreines SIC -beschichteter Graphit

2. Überlegener Wärmewiderstand und thermische Gleichmäßigkeit

3. Fine SiC crystal coated for a smooth surface

4. Hohe Haltbarkeit gegen chemische Reinigung

Main Specifications of CVD-SIC Coating

SIC-CVD-Eigenschaften
Kristallstruktur FCC -β -Phase
Dichte g/cm ³ 3.21
Härte Vickers Härte 2500
Körnung mm 2~10
Chemische Reinheit % 99.99995
Wärmekapazität J · kg-1 · k-1 640
Sublimationstemperatur 2700
Felexurale Stärke MPA (RT 4-Punkt) 415
Der Modul von Young GPA (4PT Bend, 1300 ℃) 430
Wärmeausdehnung (CTE) 10-6K-1 4.5
Wärmeleitfähigkeit (W/mk) 300
SEMICERA -Arbeitsplatz
Semizelle Arbeitsplatz 2
Ausrüstungsmaschine
CNN -Verarbeitung, chemische Reinigung, CVD -Beschichtung
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