Silicon Carbide Vacuum Chuck

Silicon Carbide Vacuum Chuck and Wafer Handling Arm is formed by isostatic pressing process and high temperature sintering. The external dimensions, thickness and shapes can be finished according to the user’s design drawings to meet the user’s specific requirements.

Silicon carbide vacuum chuck is a key component used in semiconductor manufacturing and precision industrial applications for grabbing, handling and positioning thin and fragile workpieces such as wafers, glass substrates and optical components. It uses vacuum force to create negative pressure, allowing it to firmly adhere to the surface of the workpiece and release when needed. Silicon carbide vacuum chucks are widely used in semiconductor manufacturing, flat panel displays, optical manufacturing and other precision industrial fields. They can be used for operations such as wafer loading and transfer, substrate alignment, glass plate grabbing and handling, providing high-precision, high-stability and safe workpiece handling solutions.

The characteristics of silicon carbide vacuum chucks are as follows:

1. High temperature resistance: Silicon carbide has excellent high temperature stability and can operate for a long time in a high temperature environment without damage, which is suitable for processes that require high temperature processing.

2. High hardness and wear resistance: Silicon carbide has high hardness and can resist friction and wear, increasing the durability and life of the chuck.

3. Excellent chemical inertness: Silicon carbide has high resistance to a variety of chemicals and solvents and can work stably in chemical environments.

4. High vacuum sealing: Silicon carbide vacuum suction cups can provide reliable vacuum sealing, ensuring stable adsorption force and safe grasping of workpieces.

Wir können nach Ihren spezifischen Abmessungen mit guter Qualität und angemessener Zeitzeit entwerfen und herstellen. 

 

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Advantages

Hochtemperaturoxidationswiderstand

Hervorragende Korrosionsbeständigkeit

Gute Abriebfestigkeit

Hoher Wärmungsleitfähigkeitskoeffizient

Selbstglagen, geringe Dichte

Hohe Härte

Individuelles Design.

Anwendungen

-Verschleiß-resistentes Feld: Buchse, Platte, Sandstrahldüse, Zyklonauskleidung, Schleiflauf usw.…

-Hochtemperaturfeld: SIC -Platte, Quenching -Ofenrohr, Strahlungsrohr, Tiegel, Heizelement, Walzen, Strahl, Wärmetauscher, Kaltluftrohr, Brennerdüse, Thermoelenteils -Schutzrohr, SIC -Boot, Kilnauto -Struktur, Setter usw.

-Militärisches kugelsicheres Feld

-Siliziumcarbid -Halbleiter: SiC -Waferboot, SIC -Chuck, SIC -Paddel, SiC -Kassette, SiC -Diffusionsrohr, Wafergabel, Saugschild, Führungsanleitung usw.

-Siliziumkarbiddichtungsfeld: Alle Arten von Dichtungsring, Lager, Buchse usw.

-Photovoltaikfeld: Ausleger Paddel, Schleiflauf, Siliziumkarbidwalze usw.

-Lithiumbatteriefeld

SEMICERA -Arbeitsplatz

Semizelle Arbeitsplatz 2

Ausrüstungsmaschine

CNN -Verarbeitung, chemische Reinigung, CVD -Beschichtung

Semizera Ware House

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