- heim
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- Produkte
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Silicon based GaN epitaxy
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Second Half Parts for Lower Baffles in Epitaxial Process
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LMJ microjet laser technology equipment
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Provide advanced LMJ microjet technology laser cutting equipment
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Advanced material cutting, micro jet laser processing equipment
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19 pieces of 2 inch graphite base MOCVD equipment parts
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Semiconductor Silicon based GaN epitaxy
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36 pieces of 4 inches graphite base MOCVD equipment parts
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41 pieces 4 inch graphite base MOCVD equipment parts
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High purity silicon carbide crystal boat carrier/holder
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Flexible Graphite Felt Insulation Material
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Graphite Soft Felt for Thermal Barrier Applications
