Semicera’s PSS Processing Carrier for Semiconductor Wafer Transmission is engineered for efficient handling and transfer of semiconductor wafers during manufacturing processes. Made from high-quality materials, this carrier ensures precise alignment, minimal contamination, and smooth wafer transport. Designed for the semiconductor industry, Semicera’s PSS carriers enhance process efficiency, reliability, and yield, making them an essential component in wafer processing and handling applications.
Productbeschrijving
Our company provides SiC coating process services by CVD method on the surface of graphite, ceramics and other materials, so that special gases containing carbon and silicon react at high temperature to obtain high purity SiC molecules, molecules deposited on the surface of the coated materials, forming SIC protective layer.
Hoofdkenmerken:
1. Oxidatieweerstand op hoge temperatuur:
De oxidatieweerstand is nog steeds erg goed als de temperatuur zo hoog is als 1600 C.
2. High purity : made by chemical vapor deposition under high temperature chlorination condition.
3. Erosiebestendigheid: hoge hardheid, compact oppervlak, fijne deeltjes.
4. Corrosieweerstand: zuur, alkali, zout en organische reagentia.
Hoofdspecificaties van CVD-SIC-coating
|
SIC-CVD-eigenschappen |
||
|
Kristalstructuur |
FCC β -fase |
|
|
Dikte |
g/cm ³ |
3.21 |
|
Hardheid |
Vickers Hardheid |
2500 |
|
Korrelgrootte |
mm |
2~10 |
|
Chemische zuiverheid |
% |
99.99995 |
|
Warmtecapaciteit |
J · kg-1 · K-1 |
640 |
|
Sublimatietemperatuur |
℃ |
2700 |
|
Felexurale kracht |
MPA (RT 4-punts) |
415 |
|
Young’ s Modulus |
GPA (4pt Bend, 1300 ℃) |
430 |
|
Thermische expansie (CTE) |
10-6K-1 |
4.5 |
|
Thermische geleidbaarheid |
(W/mk) |
300 |
