Product introduction and use: Placed 41 pieces of 4 hours substrate, used for growing LED with blue-green epitaxial filmDevice location of the product: in the reaction chamber, in direct contact with the waferMain downstream products: LED chipsMain end market: LED
Our company provides SiC coating process services by CVD method on the surface of graphite, ceramics and other materials, so that special gases containing carbon and silicon react at high temperature to obtain high purity SiC molecules, molecules deposited on the surface of the coated materials, forming a SiC protective layer.
1. Oxidatieweerstand op hoge temperatuur:
the oxidation resistance is still very good when the temperature is as high as 1600 ℃.
2. Hoge zuiverheid: gemaakt door chemische dampafzetting onder chloreringstoestand op hoge temperatuur.
3. Erosiebestendigheid: hoge hardheid, compact oppervlak, fijne deeltjes.
4. Corrosieweerstand: zuur, alkali, zout en organische reagentia.
| SIC-CVD-eigenschappen | ||
| Kristalstructuur | FCC β phase | |
| Dikte | g/cm ³ | 3.21 |
| Hardheid | Vickers Hardheid | 2500 |
| Korrelgrootte | μm | 2~10 |
| Chemische zuiverheid | % | 99.99995 |
| Warmtecapaciteit | J·kg-1 ·K-1 | 640 |
| Sublimatietemperatuur | ℃ | 2700 |
| Felexurale kracht | MPa (RT 4-point) | 415 |
| Young’ s Modulus | Gpa (4pt bend, 1300℃) | 430 |
| Thermische expansie (CTE) | 10-6K-1 | 4.5 |
| Thermische geleidbaarheid | (W/mk) | 300 |
