SiC Pin Trays for ICP Etching Processes in the LED Industry

Semicera’s SiC Pin Trays for ICP Etching Processes in the LED Industry are specifically designed to enhance efficiency and precision in etching applications. Made from high-quality silicon carbide, these pin trays offer excellent thermal stability, chemical resistance, and mechanical strength. Ideal for the demanding conditions of the LED manufacturing process, Semicera’s SiC pin trays ensure uniform etching, minimize contamination, and improve overall process reliability, contributing to high-quality LED production.

Productbeschrijving

Our company provides SiC coating process services by CVD method on the surface of graphite, ceramics and other materials, so that special gases containing carbon and silicon react at high temperature to obtain high purity SiC molecules, molecules deposited on the surface of the coated materials, forming SIC protective layer.

Hoofdkenmerken:

1. Oxidatieweerstand op hoge temperatuur:

De oxidatieweerstand is nog steeds erg goed als de temperatuur zo hoog is als 1600 C.

2. High purity : made by chemical vapor deposition under high temperature chlorination condition.

3. Erosiebestendigheid: hoge hardheid, compact oppervlak, fijne deeltjes.

4. Corrosieweerstand: zuur, alkali, zout en organische reagentia.

Silicon carbide etched disk (2)

Hoofdspecificaties van CVD-SIC-coating

SIC-CVD-eigenschappen

Kristalstructuur

FCC β -fase

Dikte

g/cm ³

3.21

Hardheid

Vickers Hardheid

2500

Korrelgrootte

mm

2~10

Chemische zuiverheid

%

99.99995

Warmtecapaciteit

J · kg-1 · K-1

640

Sublimatietemperatuur

2700

Felexurale kracht

MPA (RT 4-punts)

415

Young’ s Modulus

GPA (4pt Bend, 1300 ℃)

430

Thermische expansie (CTE)

10-6K-1

4.5

Thermische geleidbaarheid

(W/mk)

300

Semicera werkplek

Semicera werkplek 2

Apparatuurmachine

CNN -verwerking, chemische reiniging, CVD -coating

Onze service

Nieuwbrief

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