OurTaC-coated porous graphite plateis engineered for high-performance applications in extreme thermal and chemical environments. Combining the lightweight, high-temperature resilience of porous graphite with a chemically vapor-depositedtantalum carbide (TaC) coating, this product delivers a unique balance of mechanical strength, oxidation resistance, and structural stability. Ideal for SiC crystal growth, and semiconductor-grade environments
|
Parameter |
Specification |
|
Base Material |
Isostatic pressed porous graphite |
|
Apparent Density |
1.8 – 2.1 g/cm³ |
|
Porosity |
40 – 60% |
|
Pore Size Range |
50 – 200 μm |
|
Compressive Strength |
≥ 80 MPa (before coating) |
|
Coating Method |
Chemische dampafzetting (CVD) |
|
Coating Material |
Tantalum Carbide (TaC) |
|
Coating Thickness |
2 – 35 μm (with gradient transition zone) |
|
Working Temperature |
Up to 1800 °C in inert or reducing environments |
|
Customization |
Dimensions, porosity, and coating thickness available |
The TaC coating forms a protective Ta₂O₅ glass layer under oxidizing conditions, significantly reducing oxidation rate.
At 800 °C in air:
• Uncoated graphite: 12 mg/cm²·h
• TaC-coated plate: 0.3 mg/cm²·h
The gradient microstructure between TaC and graphite reduces interfacial thermal stress by up to 67%, preventing delamination or cracking under thermal cycling.
Strength improved by 3× in Semicera Lab testing when base strength ≥ 80 MPa.
Maintains structural stability under 1800 °C / 10 MPa, with 8× longer endurance than uncoated graphite plates.
Resistant to H₂, HCl, NH₃, and other aggressive atmospheres, making it a reliable option for MOCVD, PECVD, and high-purity furnace systems.
Semiconductor Industry
MOCVD carrier plates and susceptor bases
Crucibles, guide rings, and thermal shields in SiC crystal growth
Aerospace & Defense
High-temperature insulation and thermal barrier components
Energy Systems
Neutron moderator substrates and high-load support components under vacuum/inert conditions
Customization & Ordering
Custom shapes and dimensions available
Coating thickness and porosity tailored to your process needs
Rapid prototyping and volume production supported
All plates are produced under ISO-compliant systems, using ultra-pure precursors and CVD-grade reactors to ensure consistent quality, repeatable coating adhesion, and superior surface integrity.
