High-Temperature SiC Coating Graphite Wafer Susceptor for MOCVD Epitaxial Growth

Semicera’s SiC Coating Graphite Wafer Susceptor is a premium solution for MOCVD (Metal-Organic Chemical Vapor Deposition) processes, designed to deliver exceptional thermal stability, corrosion resistance, and longevity. Crafted from high-purity silicon carbide (SiC) and advanced graphite, this susceptor ensures uniform heat distribution and reliable performance in extreme environments, enabling flawless epitaxial growth of semiconductor materials like GaN, SiC, and LEDs.

Product Applications

  1. Semiconductor Manufacturing

    • Ideal for epitaxial deposition of GaN, SiC, and III-V compound semiconductors.

    • Critical for producing high-performance LEDs, RF devices, and power electronics.

  2. Research & Development

    • Trusted by labs for advanced material studies and next-gen semiconductor prototyping.

  3. Industrial MOCVD Systems

    • Compatible with leading MOCVD equipment for mass production of optoelectronic components.


Key Advantages

  1. Unmatched Durability

    • SiC coating enhances resistance to thermal shock, chemical corrosion, and mechanical wear, extending service life by 3x compared to traditional graphite susceptors.

  2. Superior Thermal Uniformity

    • Engineered for ±1.5% temperature uniformity across the wafer surface, minimizing defects in deposited layers.

  3. High-Temperature Stability

    • Operates seamlessly at temperatures up to 1,800°C, maintaining structural integrity in harsh MOCVD environments.

  4. Cost Efficiency

    • Reduces downtime and replacement costs thanks to prolonged durability and consistent performance.


Product Features

  1. Premium Material Composition

    • Combines high-purity isostatic graphite with a dense, defect-free SiC coating for optimal thermal and chemical resistance.

  2. Customizable Designs

    • Available in tailored geometries (e.g., pancake, vertical, horizontal) to fit diverse reactor configurations.

  3. Precision Engineering

    • Ultra-smooth surface finish (<0.5 µm Ra) ensures minimal particle contamination during deposition.

  4. Rapid Thermal Response

    • Low thermal mass design accelerates heating/cooling cycles, boosting process efficiency.


Why Choose Semicera?

  • Industry Expertise: Backed by 15+ years of experience in advanced ceramic solutions for semiconductor applications.

  • Quality Assurance: Rigorous testing under ISO-certified protocols guarantees performance consistency.

  • Global Support: Dedicated technical team available for custom solutions and rapid delivery.

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