Graphite Susceptor with Silicon Carbide Coating 8 inch wafer Carrier

Semicera’s Graphite Susceptor with Silicon Carbide Coating for 8-inch Wafer Carrier is designed for high-performance semiconductor processing, providing excellent thermal conductivity, chemical resistance, and durability. The silicon carbide coating ensures superior protection against oxidation and wear, enhancing the lifespan of the susceptor. Ideal for MOCVD, CVD, and other high-temperature applications, Semicera’s susceptor offers reliable performance, making it the perfect solution for efficient wafer handling and processing in semiconductor and LED manufacturing.

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CVD-SiC coating has the characteristics of uniform structure, compact material, high temperature resistance, oxidation resistance, high purity, acid&alkali resistance and organic reagent, with stable physical and chemical properties.
 
Compared with high-purity graphite materials, graphite begins to oxidize at 400C, which will cause a loss of powder due to oxidation, resulting in environmental pollution to peripheral devices and vacuum chambers, and increase impurities of high-purity environment.
 However, SiC coating can maintain physical and chemical stability at 1600 degrees, It is widely used in modern industry, especially in semiconductor industry.

 

 

 

 

 

 

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Principais características

 

 

 

 

 

1. High Purity sic revestido de grafite

2. Resistência ao calor superior e uniformidade térmica

3. Fine SiC crystal coated for a smooth surface

4. Alta durabilidade contra a limpeza química

 

 

 

 

 

 

 

 

 

Main Specifications of CVD-SIC Coatings:

 

 

 

 

 

SiC-CVD
Densidade (g/cc) 3.21
Flexural strength (Mpa) 470
Thermal expansion (10-6/K) 4
Condutividade térmica (W/mk) 300

 

 

 

 

 

 

 

 

Packing and Shipping

 

 

 

 

 

Supply Ability:
10000 Piece/Pieces per Month
Packaging & Delivery:
Packing:Standard & Strong Packing
Poly bag + Box + Carton + Pallet
Port:
Ningbo/Shenzhen/Shanghai
Lead Time:

Quantity(Pieces) 1 – 1000 >1000
Est. Time(days) 30 To be negotiated

 

 

 

 

 

 

 

 

Local de trabalho semicera

 

 

 

Local de trabalho semicera 2

 

 

 

Máquina de equipamentos

 

 

 

Processamento da CNN, limpeza química, revestimento de CVD

 

 

 

Ware House Semicera

 

 

 

Nosso serviço

 

 

 

 

 

 

 

 

 

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