CVD Tantalum carbide المغلفة نصفها 

With the advent of 8-inch silicon carbide (SiC) wafers, the requirements for various semiconductor processes have become increasingly stringent, especially for epitaxy processes where temperatures can exceed 2000 degrees Celsius. Traditional susceptor materials, such as graphite coated with silicon carbide, tend to sublimate at these high temperatures, disrupting the epitaxy process. However, CVD tantalum carbide (TaC) effectively addresses this issue, withstanding temperatures up to 2300 degrees Celsius and offering a longer service life. Contact Semicera’sCVD Tantalum Carbide Coated Halfmoon Partto explore more about our advanced solutions.

يوفر Semicera الطلاءات المتخصصة في Tantalum Carbide (TAC) لمختلف المكونات والناقلات.      Semicera leading coating process enables tantalum carbide (TaC) coatings to achieve high purity, high temperature stability and high chemical tolerance, improving product quality of SIC/GAN crystals and EPI layers (Graphite coated TaC susceptor), and extending the life of key reactor components. The use of tantalum carbide TaC coating is to solve the edge problem and improve the quality of crystal growth, and Semicera has breakthrough solved the tantalum carbide coating technology (CVD), reaching the international advanced level.

 

With the advent of 8-inch silicon carbide (SiC) wafers, the requirements for various semiconductor processes have become increasingly stringent, especially for epitaxy processes where temperatures can exceed 2000 degrees Celsius. Traditional susceptor materials, such as graphite coated with silicon carbide, tend to sublimate at these high temperatures, disrupting the epitaxy process. However, CVD tantalum carbide (TaC) effectively addresses this issue, withstanding temperatures up to 2300 degrees Celsius and offering a longer service life. Contact Semicera’s CVD Tantalum carbide المغلفة نصفها  لاستكشاف المزيد حول حلولنا المتقدمة. 

After years of development, Semicera has conquered the technology of CVD TaC with the joint efforts of the R&D department. Defects are easy to occur in the growth process of SiC wafers, but after using TaC, the difference is significant. Below is a comparison of wafers with and without TaC, as well as Simicera’ parts for single crystal growth.

كفاءة عالية الكفاءة طلاء كربيد tantalum_ تحسين كفاءة الإنتاج الصناعي وتقليل تكاليف الصيانة المميزة صورة  

جزء TAC للنمو الكريستال الفردي  

محمية Carbide Tantalum antiear -carbide_ تحمي المعدات من التآكل والتآكل المميز صورة  

الجرافيت مع حلقة المغلفة TAC 

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مع وبدون تاك

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بعد استخدام TAC (يمين)   

Moreover, Semicera’s TaC-coated products exhibit a longer service life and greater high-temperature resistance compared to SiC coatings. Laboratory measurements have demonstrated that our TaC coatings can consistently perform at temperatures up to 2300 degrees Celsius for extended periods. Below are some examples of our samples:

 

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TAC المغلفة SOSSOPSOR  

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الجرافيت مع مفاعل TAC المطلي  

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مكان عمل semicera 

مكان عمل semicera 2 

آلة المعدات

منزل الأدوات شبه

معالجة CNN ، التنظيف الكيميائي ، طلاء CVD   

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