High-Purity Anti-Oxidation SiC Coated MOCVD Wafer Tray

セミセラ is a supplier specializing in wafer-related and advanced semiconductor consumables. We are committed to providing high-quality, reliable, and innovative products for semiconductor manufacturing, the photovoltaic industry, and other related high-tech fields.

Our product portfolio includes SiC/TaC coated graphite components and advanced technical ceramics, covering materials such as silicon carbide (SiC), silicon nitride (Si₃N₄), and aluminum oxide (Al₂O₃), among others.

As a trusted supplier in the industry, Semicera understands the critical role of consumables in semiconductor production processes. Semicera are dedicated to delivering products that meet stringent quality standards and support the performance, stability, and efficiency required in advanced manufacturing environments.

説明

当社は提供しています CVD SiC coating services on the surface of graphite, ceramics, and other advanced substrate materials. During the process, silicon- and carbon-containing precursor gases react at high temperatures to generate high-purity silicon carbide (SiC), which is deposited onto the substrate surface to form a dense, uniform, and strongly bonded SiC protective layer.

This coating significantly improves the surface properties of the base material, enhancing its performance under high-temperature, corrosive, and high-purity process environments.

MOCVDディスク

主な機能

1. High-temperature oxidation resistance

    Stable performance under high-temperature conditions up to 1600°C in inert or controlled atmospheres, effectively preventing substrate oxidation.

2. High purity

    Produced by chemical vapor deposition (CVD) under high-temperature chlorination conditions, ensuring ultra-high purity and suitability for semiconductor-grade applications.

3. Erosion and wear resistance

    High hardness and dense microstructure provide excellent resistance to particle erosion, mechanical wear, and process gas attack.

4. Chemical corrosion resistance

    Excellent resistance to acids, alkalis, salts, and a wide range of organic chemical reagents, ensuring long-term stability in harsh environments.

5. Dense and uniform coating structure

    Pinhole-free surface with strong adhesion to the substrate, minimizing particle generation and contamination risk.

6. Long service life

    Effectively extends the lifespan of graphite and ceramic components in high-temperature industrial processes.

CVD-SICコーティングの主な仕様

SIC-CVDプロパティ
結晶構造 FCCβ相
密度 g/cm³ 3.21
硬度 ビッカーズの硬さ 2500
穀物サイズ mm 2~10
化学純度 % 99.99995
熱容量 J・kg-1・k-1 640
昇華温度 2700
フェレキュラルの強さ MPA(RT 4ポイント) 415
Young’s modulus GPA(4ptベンド、1300℃) 430
熱膨張(CTE) 10-6K-1 4.5
熱伝導率 (w/mk) 300

 MOCVDエピタキシャル部分

 装置

 について

セミセラの職場 セミセラ職場2

機器マシン 

 CNN処理、化学洗浄、CVDコーティング

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