High-Purity Anti-Oxidation SiC Coated MOCVD Wafer Tray

Półcesta is a supplier specializing in wafer-related and advanced semiconductor consumables. We are committed to providing high-quality, reliable, and innovative products for semiconductor manufacturing, the photovoltaic industry, and other related high-tech fields.

Our product portfolio includes SiC/TaC coated graphite components and advanced technical ceramics, covering materials such as silicon carbide (SiC), silicon nitride (Si₃N₄), and aluminum oxide (Al₂O₃), among others.

As a trusted supplier in the industry, Semicera understands the critical role of consumables in semiconductor production processes. Semicera are dedicated to delivering products that meet stringent quality standards and support the performance, stability, and efficiency required in advanced manufacturing environments.

Opis

Our company provides CVD SiC coating services on the surface of graphite, ceramics, and other advanced substrate materials. During the process, silicon- and carbon-containing precursor gases react at high temperatures to generate high-purity silicon carbide (SiC), which is deposited onto the substrate surface to form a dense, uniform, and strongly bonded SiC protective layer.

This coating significantly improves the surface properties of the base material, enhancing its performance under high-temperature, corrosive, and high-purity process environments.

MOCVD disk

Main Features

1. High-temperature oxidation resistance

    Stable performance under high-temperature conditions up to 1600°C in inert or controlled atmospheres, effectively preventing substrate oxidation.

2. High purity

    Produced by chemical vapor deposition (CVD) under high-temperature chlorination conditions, ensuring ultra-high purity and suitability for semiconductor-grade applications.

3. Erosion and wear resistance

    High hardness and dense microstructure provide excellent resistance to particle erosion, mechanical wear, and process gas attack.

4. Chemical corrosion resistance

    Excellent resistance to acids, alkalis, salts, and a wide range of organic chemical reagents, ensuring long-term stability in harsh environments.

5. Dense and uniform coating structure

    Pinhole-free surface with strong adhesion to the substrate, minimizing particle generation and contamination risk.

6. Long service life

    Effectively extends the lifespan of graphite and ceramic components in high-temperature industrial processes.

Main Specifications of CVD-SIC Coating

SiC-CVD Properties
Crystal Structure FCC β phase
Gęstość g/cm ³ 3.21
Hardness Vickers hardness 2500
Grain Size μm 2~10
Chemical Purity % 99.99995
Heat Capacity J·kg-1 ·K-1 640
Sublimation Temperature 2700
Felexural Strength MPa  (RT 4-point) 415
Young’s modulus Gpa (4pt bend, 1300℃) 430
Thermal Expansion (C.T.E) 10-6K-1 4.5
Przewodność cieplna (W/mK) 300

 MOCVD EPITAXIAL PARTS

 Equipment

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Miejsce pracy półcesy Półcera robocza miejsce 2

Maszyna sprzętu 

 Przetwarzanie CNN, czyszczenie chemiczne, powłoka CVD

Semicera Ware House 

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