High-Purity Anti-Oxidation SiC Coated MOCVD Wafer Tray

세미카 is a supplier specializing in wafer-related and advanced semiconductor consumables. We are committed to providing high-quality, reliable, and innovative products for semiconductor manufacturing, the photovoltaic industry, and other related high-tech fields.

Our product portfolio includes SiC/TaC coated graphite components and advanced technical ceramics, covering materials such as silicon carbide (SiC), silicon nitride (Si₃N₄), and aluminum oxide (Al₂O₃), among others.

As a trusted supplier in the industry, Semicera understands the critical role of consumables in semiconductor production processes. Semicera are dedicated to delivering products that meet stringent quality standards and support the performance, stability, and efficiency required in advanced manufacturing environments.

설명

우리 회사는 제공합니다 CVD SiC coating services on the surface of graphite, ceramics, and other advanced substrate materials. During the process, silicon- and carbon-containing precursor gases react at high temperatures to generate high-purity silicon carbide (SiC), which is deposited onto the substrate surface to form a dense, uniform, and strongly bonded SiC protective layer.

This coating significantly improves the surface properties of the base material, enhancing its performance under high-temperature, corrosive, and high-purity process environments.

mocvd 디스크

주요 기능

1. High-temperature oxidation resistance

    Stable performance under high-temperature conditions up to 1600°C in inert or controlled atmospheres, effectively preventing substrate oxidation.

2. High purity

    Produced by chemical vapor deposition (CVD) under high-temperature chlorination conditions, ensuring ultra-high purity and suitability for semiconductor-grade applications.

3. Erosion and wear resistance

    High hardness and dense microstructure provide excellent resistance to particle erosion, mechanical wear, and process gas attack.

4. Chemical corrosion resistance

    Excellent resistance to acids, alkalis, salts, and a wide range of organic chemical reagents, ensuring long-term stability in harsh environments.

5. Dense and uniform coating structure

    Pinhole-free surface with strong adhesion to the substrate, minimizing particle generation and contamination risk.

6. Long service life

    Effectively extends the lifespan of graphite and ceramic components in high-temperature industrial processes.

CVD-SIC 코팅의 주요 사양

SIC-CVD 특성
결정 구조 FCC β 상
밀도 g/cm ³ 3.21
경도 비커스 경도 2500
곡물 크기 mm 2~10
화학적 순도 % 99.99995
열용량 J · KG-1 · K-1 640
승화 온도 2700
Felexural 강도 MPA (RT 4 점) 415
Young’s modulus GPA (4pt Bend, 1300 ℃) 430
열 팽창 (CTE) 10-6K-1 4.5
열전도율 (w/mk) 300

 MoCVD 에피 택셜 부품

 장비

 ~에 대한

세미 케라 작업 장소 Semicera Work Place 2

장비 기계 

 CNN 가공, 화학 세정, CVD 코팅

세미 케라웨어 하우스 

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